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Photoresist stripping composition

  • US 5,648,324 A
  • Filed: 01/23/1996
  • Issued: 07/15/1997
  • Est. Priority Date: 01/23/1996
  • Status: Expired due to Fees
First Claim
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1. A photoresist stripper composition comprising:

  • (a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;

    (b) from about 70 to about 20% by weight of an alkanolamine compound; and

    (c) from about 0.1 to about 10% by weight of 2,2'"'"'-[[(methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol;

    all percents based on the weight of the stripper composition.

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  • 4 Assignments
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