Photoresist stripping composition
First Claim
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1. A photoresist stripper composition comprising:
- (a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
(b) from about 70 to about 20% by weight of an alkanolamine compound; and
(c) from about 0.1 to about 10% by weight of 2,2'"'"'-[[(methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol;
all percents based on the weight of the stripper composition.
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Abstract
A photoresist stripping composition containing:
(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
(b) 70-20% by weight of alkanolamine compounds; and
(c) 0.1-10% by weight of 2,2'"'"'[[methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol.
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Citations
4 Claims
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1. A photoresist stripper composition comprising:
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(a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) from about 70 to about 20% by weight of an alkanolamine compound; and (c) from about 0.1 to about 10% by weight of 2,2'"'"'-[[(methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol;
all percents based on the weight of the stripper composition. - View Dependent Claims (2, 3, 4)
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Specification