Method and apparatus for cleaning substrates in preparation for deposition of thin film coatings
First Claim
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1. A method of cleaning a substrate in preparation for thin film coating comprising the steps of:
- providing a cleaning chamber having air inlet means and air exhaust means and introducing air into said cleaning chamber through said air inlet means and exhausting air form said cleaning chamber through said air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels, wherein said cleaning chamber includes a substrate entry and a substrate exitmaintaining air pressure within said cleaning chamber at a positive pressure relative to atmospheric pressure;
providing an entry chamber adjacent to said substrate entry in which said entry chamber includes an air inlet means and air exhaust means for maintaining air pressure and flow within said entry chamber at desired levels;
transporting a substrate to be cleaned to a cleaning position within said cleaning chamber; and
exposing said substrate to a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium, said blast of carbon dioxide pellets being effective to clean said substrate in preparation for thin film coating.
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Abstract
A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium.
99 Citations
22 Claims
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1. A method of cleaning a substrate in preparation for thin film coating comprising the steps of:
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providing a cleaning chamber having air inlet means and air exhaust means and introducing air into said cleaning chamber through said air inlet means and exhausting air form said cleaning chamber through said air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels, wherein said cleaning chamber includes a substrate entry and a substrate exit maintaining air pressure within said cleaning chamber at a positive pressure relative to atmospheric pressure; providing an entry chamber adjacent to said substrate entry in which said entry chamber includes an air inlet means and air exhaust means for maintaining air pressure and flow within said entry chamber at desired levels; transporting a substrate to be cleaned to a cleaning position within said cleaning chamber; and exposing said substrate to a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium, said blast of carbon dioxide pellets being effective to clean said substrate in preparation for thin film coating. - View Dependent Claims (2, 3, 4, 5)
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6. A method of cleaning a substrate in preparation for thin film coating comprising the steps of:
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providing a cleaning chamber having air inlet means and air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels, wherein said cleaning chamber includes a substrate entry and a substrate exit; providing an air exit chamber adjacent to said substrate exit in which said exit chamber includes an air inlet means and air exhaust means for maintaining air pressure and flow within said exit chamber at desired levels; transporting a substrate to be cleaned to a cleaning position within said cleaning chamber; exposing said substrate to a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium, said blast of carbon dioxide pellets being effective to clean said substrate in preparation for thin film coating; and maintaining air pressure within said cleaning chamber at a positive pressure relative to atmospheric pressure. - View Dependent Claims (7)
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8. A method of cleaning a substrate in preparation for thin film coating comprising the steps of:
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providing a cleaning chamber having air inlet means and air exhaust means wherein said air inlet means is a clean air inlet and is provided near the top of said cleaning chamber and introducing air into said cleaning chamber through said air inlet means and exhausting air from said cleaning chamber through said air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels; transporting a substrate to be cleaned to a cleaning position within said cleaning chamber; and exposing said substrate to a blast carbon dioxide pellets suspended in and transported by a compressed gas medium, said blast of carbon dioxide pellets being effective to clean said substrate in preparation for thin film coating. - View Dependent Claims (9, 10)
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11. An apparatus for cleaning a substrate in preparation for thin film coating comprising:
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a cleaning chamber having a substrate entry and a substrate exit;
transport means for transporting said substrate through said substrate entry and into said cleaning chamber and for transporting said substrate out of said cleaning chamber through said substrate exit;air inlet means and air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels, wherein said air inlet means includes a clean air inlet near the top of said cleaning chamber and wherein said air exhaust means includes an ionizing vacuum pickup; and carbon dioxide particle dispensing means for dispensing carbon dioxide pellets into cleaning engagement with said substrate within said cleaning chamber. - View Dependent Claims (12)
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13. An apparatus for cleaning a substrate in preparation for thin film coating comprising:
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a cleaning chamber having a substrate entry and a substrate exit, said substrate exit including a substrate exit separate from said substrate entry and an entry chamber adjacent to said substrate entry; transport means for transporting said substrate through said substrate entry and into said cleaning chamber and for transporting said substrate out of said cleaning chamber through said substrate exit; air inlet means and air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels; and carbon dioxide particle dispensing means for dispensing carbon dioxide pellets into cleaning engagement with said substrate within said cleaning chamber. - View Dependent Claims (14, 15, 16)
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17. An apparatus for cleaning a substrate in preparation for thin film coating comprising:
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a cleaning chamber having a substrate entry and a substrate exit, said substrate exit including a substrate exit separate from said substrate entry and an exit chamber adjacent to said substrate exit; transport means for transporting said substrate through said substrate entry and into said cleaning chamber and for transporting said substrate out of said cleaning chamber through said substrate exit; air inlet means and air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels; and carbon dioxide particle dispensing means for dispensing carbon dioxide pellets into cleaning engagement with said substrate within said cleaning chamber. - View Dependent Claims (18, 19, 20, 21)
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22. An apparatus for cleaning a substrate in preparation for thin film coating comprising:
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a cleaning chamber having a substrate entry and a substrate exit separate from said substrate entry; transport means for transporting said substrate through said substrate entry and into said cleaning chamber and for transporting said substrate out of said cleaning chamber through said substrate exit; air inlet means and air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels; and carbon dioxide particles dispensing means for dispensing carbon dioxide pellets into cleaning engagement with said substrate within said cleaning chamber.
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Specification