Process for the recycling of spent indium oxide-tin oxide sputtering targets
First Claim
Patent Images
1. Process for recycling of compacted indium tin oxide sputtering targets consisting essentially of grains having a grain size of 0.1 to 10 μ
- m said process comprisingcoarse grinding said compacted targets into a powder having a particle size less than 500 μ
m, the bulk of the powder having particle size over 100 μ
m,removing any particles having a size over 250 μ
m,hot isostatic pressing said powder under temperature and pressure, said temperature being sufficiently low that no significant recrystallization takes place, said pressure being sufficiently high that a theoretical density over 93% is obtained.
1 Assignment
0 Petitions
Accused Products
Abstract
Compacted ITO material is ground to a powder with particles in the size range of less than 500 μm, whereupon the powder thus obtained is molded into new target blanks, either alone or in a mixture with unused ITO powder, under the simultaneous action of pressure and temperature. The temperature is kept sufficiently low so that recrystallization does not take place and the original grain size is preserved.
10 Citations
4 Claims
-
1. Process for recycling of compacted indium tin oxide sputtering targets consisting essentially of grains having a grain size of 0.1 to 10 μ
- m said process comprising
coarse grinding said compacted targets into a powder having a particle size less than 500 μ
m, the bulk of the powder having particle size over 100 μ
m,removing any particles having a size over 250 μ
m,hot isostatic pressing said powder under temperature and pressure, said temperature being sufficiently low that no significant recrystallization takes place, said pressure being sufficiently high that a theoretical density over 93% is obtained. - View Dependent Claims (2, 3, 4)
- m said process comprising
Specification
-
- Resources
Litigation Campaign Assessment
Thank you for your request. You will receive a custom alert email when the Litigation Campaign Assessment is available.
×
-
Current AssigneeLeybold Materials GmbH
-
Original AssigneeLeybold Materials GmbH
-
InventorsSchlott, Martin, Dauth, Wolfgang, Kutzner, Martin
-
Primary Examiner(s)Straub, Gary P.
-
Application NumberUS08/524,468Time in Patent Office719 DaysField of Search23/313 R, 23/293 R, 204/192.1, 264/65, 264/122US Class Current264/122CPC Class CodesC04B 35/457 based on tin oxides or stan...C04B 35/645 Pressure sinteringC23C 14/3414 Metallurgical or chemical a...
