Method of planarizing a layer of material
First Claim
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1. A method of forming a planar layer having a predetermined thickness above a circuit feature of a semiconductor device comprising the steps of:
- forming a first layer of a first material atop a surface of a semiconductor substrate and circuit feature with said predetermined thickness above said circuit feature;
forming in one fabrication step, a thin continuous trace layer of a doped silicon oxide material on the entire surface of said first layer;
forming a second layer of material on said trace layer;
planarizing said second layer by removing portions of said second layer;
detecting when the removal of said second layer reaches a portion of said trace layer; and
terminating planarization upon detection of said portion of said trace layer whereby the resulting layer is planar having said pre-determined thickness above said circuit features.
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Abstract
A method of planarizing a layer of material having a pre-determined thickness above a circuit feature on a semiconductor device is provided. A first layer of material is formed atop the surface of the semiconductor substrate and circuit feature to a pre-determined thickness. A thin, continuous trace layer of doped silicon oxide material is formed atop the first layer, and then a second layer of material is formed atop the trace layer. The second layer is planarized, and planarization is terminated upon reaching the trace layer, thereby providing a semiconductor with a planar layer.
45 Citations
21 Claims
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1. A method of forming a planar layer having a predetermined thickness above a circuit feature of a semiconductor device comprising the steps of:
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forming a first layer of a first material atop a surface of a semiconductor substrate and circuit feature with said predetermined thickness above said circuit feature; forming in one fabrication step, a thin continuous trace layer of a doped silicon oxide material on the entire surface of said first layer; forming a second layer of material on said trace layer; planarizing said second layer by removing portions of said second layer; detecting when the removal of said second layer reaches a portion of said trace layer; and terminating planarization upon detection of said portion of said trace layer whereby the resulting layer is planar having said pre-determined thickness above said circuit features. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming a planar layer having a predetermined thickness above a circuit feature of a semiconductor device comprising the steps of:
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(a) forming a first layer of a first a material atop a surface of a semiconductor substrate and circuit feature with said predetermined thickness above said circuit feature; (b) forming in one fabrication step, a thin continuous trace layer of a doped silicon oxide material on the entire surface of said first layer; (c) forming a second layer of material on said trace layer; (d) planarizing said second layer by removing portions of said second layer; (e) detecting when the removal of said second layer reaches a portion of said trace layer; (f) terminating planarization upon detection of said portion of said trace layer whereby the resulting layer is planar having said pre-determined thickness above said circuit features; and (g) repeating steps (a), (b), (c), (d), (e), and (f) in sequence N times, where N is an integer and N is greater than, or equal to, 1. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification