Method of fabricating a semiconductor device using element isolation by field shield
First Claim
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1. A method of making a semiconductor device comprising the steps of:
- forming a field shield electrode of a thin film of at least one of polysilicon and amorphous silicon on a surface of an element-isolation region of a semiconductor substrate with a first insulating film interposed therebetween and having a thickness of no more than 10 nm nor less than 5 nm for defining an active region in said substrate surrounded by said field shield electrode;
forming a second insulating film on a surface of said active region at its area where a gate electrode of a transistor is to be formed, the thickness of said first insulating film being less than the thickness of said second insulating film; and
applying heat treatment at a temperature not lower than 700°
C. to said semiconductor substrate on which at least said field shield electrode is formed.
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Abstract
A method of making a semiconductor device and includes a step of forming a field shield electrode of a thin film of at least one of polysilicon and amorphous silicon on an element-isolation region of a semiconductor substrate. An insulating film is interposed therebetween and having a thickness of less than 10 nm and not less than 5 nm. A further step includes applying heat treatment at a temperature not lower than 700° C. to the semiconductor substrate on which at least the field shield electrode is formed.
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3 Claims
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1. A method of making a semiconductor device comprising the steps of:
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forming a field shield electrode of a thin film of at least one of polysilicon and amorphous silicon on a surface of an element-isolation region of a semiconductor substrate with a first insulating film interposed therebetween and having a thickness of no more than 10 nm nor less than 5 nm for defining an active region in said substrate surrounded by said field shield electrode; forming a second insulating film on a surface of said active region at its area where a gate electrode of a transistor is to be formed, the thickness of said first insulating film being less than the thickness of said second insulating film; and applying heat treatment at a temperature not lower than 700°
C. to said semiconductor substrate on which at least said field shield electrode is formed. - View Dependent Claims (2, 3)
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Specification