Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor

• US 5,674,321 A
• Filed: 04/28/1995
• Issued: 10/07/1997
• Est. Priority Date: 04/28/1995
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Pu, Bryan, Shan, Hongching
• Primary Examiner(s): Niebling, John
• Assistant Examiner(s): CHANG, JONI YUK YING
• Application Number:
  US08/431,178
• Time in Patent Office: 893 Days
• Field of Search: 118/723 MR, 118/723 MA, 118/723 E, 118/723 ER, 204/298.16, 204/298.2, 204/298.72, 204/298.37, 427/571
• US Class Current: 118/723.0MR
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H01J 37/3266 Magnetic control means
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

A magnetic field enhanced plasma etch reactor system for generating a radially-directed magnetic field within a reaction chamber. The reactor system comprises a reaction chamber for containing a plasma and a plurality of electromagnetic coils disposed about a reaction region within the reaction chamber. When each coil is driven with a current of similar magnitude, the electromagnetic coils produce a radially-directed magnetic field within the reaction chamber. The radially-directed magnetic field uniformly distributes the plasma throughout a bulk plasma region. Consequently, a substrate that is etched by such a uniform plasma has an improved uniformity in the etch pattern on the substrate.

Claims

1. A magnetic field-enhanced plasma reactor comprising:

a reaction chamber for containing a plasma proximate a substrate support;

a plurality of substantially annular electromagnets circumscribing a reaction region within the reaction chamber for forming a radially-directed magnetic field within the reaction chamber wherein at least one of said plurality of electromagnets is below the substrate support and a remaining number of electromagnets are above the substrate support, coaxially aligned, and stacked one on top of the other; and

a current generator, connected to said plurality of electromagnets, for applying a current to each electromagnet in said plurality of electromagnets, where each of the currents flow in opposite directions through adjacent electromagnets.

2. The reactor of claim 1 wherein the current flowing in each electromagnet is a DC current.

3. The reactor of claim 1 wherein the current flowing in each electromagnet is a AC current.

4. The reactor of claim 1 wherein said substrate support has a surface that defines a plane wherein one of said plurality of substantially annular electromagnets is positioned below the plane and three substantially annular electromagnets in said plurality of substantially annular electromagnets are coaxially aligned, and stacked one on top of the other.

5. In a magnetic field-enhanced plasma reactor having a plurality of electromagnets circumscribing a reaction region within a reaction chamber wherein at least one of said plurality of electromagnets is below a substrate support and a remaining number of electromagnets are above the substrate support, coaxially aligned, and stacked one on top of the other, a method comprising the steps of:

applying a current to each of said electromagnets in said plurality of electromagnets, where each of said currents flow in opposite directions through adjacent electromagnets; and

generating a radially directed magnetic field within said reaction chamber.

6. The method of claim 5 wherein said generating step further comprises the step of generating planar regions of enhanced plasma located between adjacent electromagnets.

7. The method of claim 5 wherein said current is an AC current.

8. The method of claim 5 wherein said current is a DC current.

9. The method of claim 5 wherein said currents flowing in each of said electromagnets have substantially similar magnitudes.