Illuminating arrangement including a zoom objective incorporating two axicons

• US 5,675,401 A
• Filed: 06/15/1995
• Issued: 10/07/1997
• Est. Priority Date: 06/17/1994
• Status: Expired due to Term

• Current Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Original Assignee: Carl-Zeiss-Stiftung
• Inventors: Wangler, Johannes, Richter, Gerald
• Primary Examiner(s): Grimley, Arthur T.
• Assistant Examiner(s): KERNER, HERBERT
• Application Number:
  US08/490,752
• Time in Patent Office: 845 Days
• Field of Search: 355/67, 355/53, 355/71, 362/268
• US Class Current: 355/67
• CPC Class Codes: G02B 13/143 for use with ultraviolet radiation
• CPC Class Codes: G02B 15/04 by changing a part
• CPC Class Codes: G02B 5/001 Axicons, waxicons, reflaxicons
• CPC Class Codes: G02B 6/4206 Optical features G02B6/4207, G02B6/421 take precedence
• CPC Class Codes: G02B 6/4298 coupling with non-coherent light sources and/or radiation detectors, e.g. lamps, incandescent bulbs, scintillation chambers
• CPC Class Codes: G03F 7/2002 with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
• CPC Class Codes: G03F 7/70066 Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70183 Zoom systems for adjusting beam diameter

Abstract

An illumination system for an optical system such as a microlithographic projection exposure system includes a zoom lens 2 for varying the degree of coherence σ and two axicons (22, 23) with an adjustable distance therebetween. The distance can preferably be reduced to zero. The illumination system provides continuous, conventional illumination with a variable degree of coherence σ and annular illumination or multipole illumination with different geometries with low losses of light.

Claims

1. An illuminating arrangement for an optical system such as a microlithographic projection exposure apparatus, the illuminating arrangement comprising:

a light source for emitting illuminating light along an optical axis;

a zoom objective mounted on said optical axis and defining a light-entry surface and a light-exit surface and said zoom objective having at least one zoom lens;

a first displacement drive for shifting said zoom lens along said axis for varying the degree of coherence σ

of said illuminating light

two axicons integrated within said zoom objective between said light-entry surface and said light-exit surface; and

,

a second displacement drive for shifting said two axicons relative to each other along said optical axis for adjusting the distance therebetween.

2. The illuminating arrangement of claim 1, said axicons each defining an apex angle α

and the apex angles of said axicons being substantially equal.

3. The illuminating arrangement of claim 2, at least one of said axicons being movable along said optical axis to reduce said distance until said axicons come in contact engagement with each other.

4. The illuminating arrangement of claim 1, said axicons defining respective conical surfaces.

5. The illuminating arrangement of claim 1, said axicons defining respective pyramidal surfaces.

7. The illuminating arrangement of claim 1, wherein the light emitted by said light source and transmitted by said axicons is noncollimated.

8. The illuminating arrangement of claim 1, wherein conventional illumination and annular illumination or multipole illumination with different geometries can be continuously adjusted by varying said distance between said two axicons or the position of said zoom lens.

9. The illuminating arrangement of claim 1, further comprising a glass rod defining a light integrator;

and, said glass rod being arranged on said optical axis downstream of said zoom objective.

10. The illuminating arrangement of claim 9, said glass rod having an output end face transverse to said optical axis;

and, the arrangement further comprising a masking system positioned at said output end face.

11. The illuminating arrangement of claim 9, wherein:

the path of the light emanating from said glass rod is unobstructed by a beam-shaping diaphragm.

12. The illuminating arrangement of claim 1, said light source including a lamp mirror defining a focus on said optical axis;

and, a diaphragm mounted on said optical axis outside of said focus to define a secondary light source.

13. The illuminating arrangement of claim 1, wherein said first and second displacement drives are program controlled by a computer.

14. The illuminating arrangement of claim 1, wherein said one zoom lens is a first zoom lens and said zoom objective includes a second zoom lens;

and, said first displacement drive is adapted to shift both said first and second zoom lenses along said optical axis.

15. The illuminating arrangement of claim 14, said first zoom lens of said zoom objective having first and second lens components arranged on said optical axis;

one of said lens components being movable along said axis toward or away from the other one of said lens components;

said other lens component being stationary and said lens components having respective lens surfaces facing each other; and

, said lens surfaces having almost the same radius of curvature; and

, said one lens component being movable so as to bring said lens surfaces in mutual contact engagement.

16. The illuminating arrangement of claim 15, said first and second lens components consisting of glass having the same index of refraction (n).

17. The illuminating arrangement of claim 16, wherein said second zoom lens is downstream of said axicons;

and, said one lens component and said second zoom lens are positioned far away from said two axicons for low values of said coherence factor σ and

close to said two axicons for high values of said coherence factor σ

.

6. An illuminating arrangement for an optical system such as a microlithographic projection exposure apparatus, the illuminating arrangement comprising:

a light source for emitting illuminating light along an optical axis;

a zoom objective mounted on said optical axis and having first and second zoom lenses for transmitting said light;

a first displacement drive for shifting one of said lenses along said axis to adjust the coherence factor σ

of said light transmitted by said lenses;

two axicons arranged in said zoom objective;

a second displacement drive for shifting said two axicons relative to each other along said optical axis for adjusting the distance therebetween; and

,

said axicons having respective contact surfaces which come into mutual contact engagement when said distance is reduced to a minimum;

at least one of said axicons having a boundary surface opposite the contact surface thereof; and

, said boundary surface being curved.

18. An illuminating arrangement for an optical system such as a microlithographic projection exposure apparatus, the illuminating arrangement comprising:

a light source for emitting illuminating light along an optical axis;

a zoom objective mounted on said optical axis having first and second zoom lenses for transmitting light;

a first displacement drive for shifting one of said zoom lenses along said axis to adjust the coherence factor σ

of said light transmitted by said lenses;

two axicons integrated within said zoom objective; and

,

a second displacement drive for shifting said two axicons relative to each other along said optical axis for adjusting the distance therebetween.

19. The illuminating arrangement of claim 18, wherein said two axicons are arranged between said first and second zoom lenses.