Highly abrasion-resistant, flexible coatings for soft substrates
First Claim
1. A method for depositing onto a parent substrate an abrasion wear resistant coating material consisting of C, H, Si and O which comprises:
- (a) chemically cleaning the surface of said substrate to remove contaminants;
(b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber;
(c) etching the surface of said substrate with a material selected from the group consisting of energetic ions, reactive species and mixtures thereof to further remove residual contaminants, and to activate the surface;
(d) depositing onto the surface of said substrate a layer of said abrasion wear resistant material by exposing said substrate to a deposition flux containing carbon, hydrogen, silicon and oxygen and generated by a plasma, whereby said deposition flux is activated by said plasma and said substrate is bombarded by energetic ions during the deposition;
(e) increasing the vacuum chamber pressure to atmospheric pressure; and
(f) recovering a product coated with said abrasion wear resistant material having the properties of a Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1%.
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Accused Products
Abstract
An abrasion wear resistant coated substrate product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen. The abrasion wear resistant coating material has the properties of Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1% and a transparency greater than 85% in the visible spectrum. The coated products of the present invention are suitable for use in optical applications such as ophthalmic lenses or laser bar code scanner windows. In the method for making the products, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and the air in said chamber is evacuated. In the third step, the substrate surface is bombarded with energetic ions and/or reactive species to assist in the removal of residual hydrocarbons and surface oxides, and to activate the surface. After the substrate surface has been etched, a protective, abrasion-resistant coating is deposited by plasma or ion beam deposition. Once the chosen thickness of the coating has been achieved, the deposition process on the substrates is terminated, the vacuum chamber pressure is increased to atmospheric pressure, and the coated substrate products having improved abrasion-resistance are removed from the vacuum chamber.
186 Citations
16 Claims
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1. A method for depositing onto a parent substrate an abrasion wear resistant coating material consisting of C, H, Si and O which comprises:
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(a) chemically cleaning the surface of said substrate to remove contaminants; (b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber; (c) etching the surface of said substrate with a material selected from the group consisting of energetic ions, reactive species and mixtures thereof to further remove residual contaminants, and to activate the surface; (d) depositing onto the surface of said substrate a layer of said abrasion wear resistant material by exposing said substrate to a deposition flux containing carbon, hydrogen, silicon and oxygen and generated by a plasma, whereby said deposition flux is activated by said plasma and said substrate is bombarded by energetic ions during the deposition; (e) increasing the vacuum chamber pressure to atmospheric pressure; and (f) recovering a product coated with said abrasion wear resistant material having the properties of a Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1%. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for depositing onto a parent substrate an abrasion wear resistant coating material consisting of C, H, Si and O which comprises:
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(a) chemically cleaning the surface of said substrate to remove contaminants; (b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said chamber; (c) etching the surface of said substrate with a material selected from the group consisting of energetic ions, reactive species and mixtures thereof to further remove residual contaminants, and to activate the surface; (d) depositing onto the surface of said substrate an intermediate layer of said abrasion wear resistant material by exposing said substrate to a deposition flux containing carbon, hydrogen, silicon and oxygen having the properties of a Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1% and generated by a plasma, whereby said deposition flux is activated by said plasma and said substrate is bombarded by energetic ions during the deposition; (e) depositing onto said intermediate layer an outer layer of diamond-like carbon; (f) increasing the vacuum chamber pressure to atmospheric pressure; and (g) recovering a coated abrasion wear resistant product. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification