Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces
First Claim
1. A plasma processing chamber having aluminum surfaces including a planar aluminum surface and a sidewall aluminum surface on an aluminum susceptor therein protected from attack by species generated by a plasma generated in said chamber comprising ceramic surfaces, characterized by good dielectric properties, good thermal conductivity, and good thermal shock resistance, mounted between said aluminum surfaces and said plasma and in contact with said aluminum surfaces, but not bonded thereto, to thereby protect said aluminum surfaces while mitigating damage to said protective ceramic surfaces from thermal expansion rate mismatch between said aluminum surfaces and said ceramic surfaces, said aluminum susceptor provided with a ceramic disk on said planar aluminum surface of said aluminum susceptor, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom extending over said sidewall aluminum surface of said aluminum susceptor to thereby inhibit contact of said aluminum surfaces on said aluminum susceptor by said species generated by said plasma.
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Accused Products
Abstract
Non-bonded ceramic protection is provided for metal surfaces in a plasma processing chamber, particularly heated metal electrode surfaces, in a plasma processing chamber, to prevent or inhibit attack of the heated metal surfaces by chemically aggressive species generated in the plasma during processing of materials, without bonding the ceramic material to the metal surface. In accordance with the invention the ceramic protection material comprises a thin cover material which is fitted closely, but not bonded, to the heated metal. This form of ceramic protection is particularly useful for protecting the surfaces of glow discharge electrodes and gas distribution apparatus in plasma process chambers used for processing semiconductor substrates to form integrated circuit structures. The particular ceramic material used to provide the desired protection from the gaseous species generated by the plasma are selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide.
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Citations
30 Claims
- 1. A plasma processing chamber having aluminum surfaces including a planar aluminum surface and a sidewall aluminum surface on an aluminum susceptor therein protected from attack by species generated by a plasma generated in said chamber comprising ceramic surfaces, characterized by good dielectric properties, good thermal conductivity, and good thermal shock resistance, mounted between said aluminum surfaces and said plasma and in contact with said aluminum surfaces, but not bonded thereto, to thereby protect said aluminum surfaces while mitigating damage to said protective ceramic surfaces from thermal expansion rate mismatch between said aluminum surfaces and said ceramic surfaces, said aluminum susceptor provided with a ceramic disk on said planar aluminum surface of said aluminum susceptor, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom extending over said sidewall aluminum surface of said aluminum susceptor to thereby inhibit contact of said aluminum surfaces on said aluminum susceptor by said species generated by said plasma.
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8. A plasma processing chamber having an aluminum susceptor therein protected from attack by species generated by a plasma generated in said chamber by ceramic surfaces mounted between said aluminum susceptor and said plasma and in contact with said aluminum susceptor but not bonded thereto, said ceramic surfaces further comprising:
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a) a ceramic disk mounted on a planar surface of said aluminum susceptor, between said susceptor and said plasma; b) a ceramic collar in peripheral contact with the exposed surface of said ceramic disk; c) a ceramic skirt depending from said ceramic collar and extending over sidewall surfaces of said aluminum susceptor; and d) fastening means to urge said collar against said ceramic disc and said aluminum susceptor; to thereby inhibit contact of said aluminum susceptor surfaces by said gaseous species generated by said plasma, while mitigating damage to said protective ceramic surfaces from thermal expansion rate mismatch between said aluminum susceptor and said ceramic surfaces. - View Dependent Claims (9)
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10. A process for treating semiconductor substrates in a plasma processing chamber having an aluminum susceptor electrode and an aluminum showerhead electrode therein while inhibiting attack of exposed aluminum surfaces of said aluminum electrodes by gaseous species generated in said chamber by a generated plasma which comprises covering said exposed aluminum surfaces on said aluminum susceptor and aluminum showerhead electrodes with a removable protective layer of a ceramic material selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide without bonding of said ceramic material to said aluminum surface to thereby protect said exposed aluminum surfaces from attack from said gaseous species generated by said plasma while inhibiting cracking of said ceramic material by thermal mismatching with said exposed aluminum surfaces, said aluminum susceptor provided with a ceramic disk on said planar aluminum surface of said aluminum susceptor, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom extending over a sidewall aluminum surface of said aluminum susceptor to thereby inhibit contact of said exposed aluminum surfaces on said aluminum susceptor by said species generated by said plasma.
- 11. A plasma processing chamber having metal surfaces therein, including a planar metal surface and a sidewall metal surface on a metal susceptor therein, protected from attack by species generated by a plasma generated in said chamber by protective removable ceramic surfaces characterized by good dielectric properties, good thermal conductivity, and good thermal shock resistance, and mounted between said metal surfaces and said plasma, including said planar and sidewall metal surfaces of said metal susceptor, and in contact with said metal surfaces, but not bonded thereto, to thereby protect said planar and sidewall metal surfaces of said metal susceptor from said attack by species in said plasma, while mitigating damage to said protective removable ceramic surfaces from thermal expansion rate mismatch between said metal surfaces and said protective removable ceramic surfaces, said metal susceptor provided with a ceramic disk on said planar metal surface of said metal susceptor, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom to extend over said sidewall metal surface of said metal susceptor to thereby inhibit contact of said metal surfaces on said metal susceptor by said species generated by said plasma.
- 14. A plasma processing chamber capable of generating, in a plasma therein, gaseous species capable of attacking aluminum surfaces in said chamber, said plasma processing chamber having an aluminum susceptor therein for mounting a semiconductor substrate thereon and an aluminum showerhead for introducing processing gases into said chamber, said aluminum susceptor provided with a generally circular ceramic disc with a first generally planar surface facing said aluminum showerhead and also having sidewall surfaces thereon, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom extending over said sidewall surfaces of said aluminum susceptor to thereby inhibit contact of said aluminum susceptor surfaces by said gaseous species generated by said plasma, said aluminum showerhead also having a generally planar surface facing said aluminum susceptor and also having sidewall surfaces thereon, each of said aluminum susceptor and showerhead surfaces having mounted thereon a protective layer of a ceramic material selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide, without bonding of said ceramic material to said aluminum surface, to thereby protect said aluminum surfaces from attack from said gaseous species generated by said plasma while inhibiting cracking of said ceramic material by thermal mismatching with said aluminum surfaces.
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22. A plasma processing chamber capable of generating, in a plasma therein, gaseous species capable of attacking aluminum surfaces in said chamber, said plasma processing chamber having an aluminum susceptor therein for mounting a semiconductor substrate thereon and an aluminum showerhead for introducing processing gases into said chamber;
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a) said aluminum susceptor further comprising; i) a generally circular aluminum disc having a first generally planar surface facing said aluminum showerhead and also having sidewall surfaces thereon; ii) a cup-like shell of ceramic material contacting said planar and sidewall surfaces of said aluminum susceptor to protect said aluminum susceptor from said gaseous species generated by said plasma; and iii) fastening apparatus provided with portions of said shell of ceramic material adjacent said sidewall surfaces of said aluminum susceptor to urge said shell of ceramic material against said aluminum susceptor, said fastening apparatus comprising an annular groove in the inner surface of said ceramic shell adjacent said aluminum susceptor sidewalls having a width in excess of the thickness of said aluminum susceptor, and retention means received in said annular groove which contact an opposite surface of said aluminum susceptor to urge said ceramic shell against said planar surface of said aluminum susceptor facing said aluminum showerhead; b) said aluminum showerhead further comprising; i) a generally planar surface facing said aluminum susceptor; ii) sidewall surfaces thereon; and iii) a protective layer of a ceramic material mounted on said planar and sidewall aluminum showerhead surfaces; said ceramic material on said aluminum susceptor and said aluminum showerhead selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide, said ceramic material mounted on said aluminum surfaces on said aluminum susceptor and said aluminum showerhead, without bonding of said ceramic material thereto, to thereby protect said aluminum surfaces from attack from said gaseous species generated by said plasma while inhibiting cracking of said ceramic material by thermal mismatching with said aluminum surfaces. - View Dependent Claims (23)
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24. A plasma processing chamber capable of generating, in a plasma therein, gaseous species capable of attacking aluminum surfaces in said chamber, said plasma processing chamber having an aluminum susceptor therein for mounting a semiconductor substrate thereon and an aluminum showerhead for introducing processing gases into said chamber;
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a) said aluminum susceptor further comprising; i) a generally circular aluminum disc having a first generally planar surface facing said aluminum showerhead and also having sidewall surfaces thereon; ii) a cup-like shell of ceramic material contacting said planar and sidewall surfaces of said aluminum susceptor to protect said aluminum susceptor from said gaseous species generated by said plasma; iii) a ceramic disc having a diameter approximately equal to the inner diameter of said portion of said ceramic shell adjacent said aluminum susceptor sidewalls and having one surface thereof positioned against a rear surface of said aluminum susceptor facing away from said aluminum showerhead, said ceramic disc being provided with one or more tabs thereon; and iv) fastening apparatus provided with portions of said shell of ceramic material adjacent said sidewall surfaces of said aluminum susceptor to urge said shell of ceramic material against said aluminum susceptor, said fastening apparatus further comprising an annular groove in the inner surface of said portion of said ceramic shell adjacent said aluminum susceptor sidewall at a distance from the inner surface of the top of said ceramic shell in excess of the thickness of said aluminum susceptor, and one or more slots provided in the bottom surface of said ceramic shell in communication with said annular groove, and in alignment with said tabs on said ceramic disc to permit said tabs to be received in said slots and rotated in said annular groove to thereby retain said ceramic shell against the said planar surface of said aluminum susceptor facing said aluminum showerhead, while also retaining said ceramic disc against said aluminum susceptor; b) said aluminum showerhead further comprising; i) a generally planar surface facing said aluminum susceptor; ii) sidewall surfaces thereon; and iii) a protective layer of a ceramic material mounted on said planar and sidewall aluminum showerhead surfaces; said ceramic material on said aluminum susceptor and said aluminum showerhead selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide, said ceramic material mounted on said aluminum surfaces on said aluminum susceptor and said aluminum showerhead, without bonding of said ceramic material thereto, to thereby protect said aluminum surfaces from attack from said gaseous species generated by said plasma while inhibiting cracking of said ceramic material by thermal mismatching with said aluminum surfaces. - View Dependent Claims (25, 26, 27, 28)
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- 29. A system for protecting the metal surfaces of a metal susceptor, including a planar metal surface and a sidewall metal surface on said metal susceptor, from attack by species generated by a plasma generated in a plasma processing chamber, comprising removable ceramic members having protective ceramic surfaces thereon characterized by good dielectric properties, good thermal conductivity, and good thermal shock resistance, and capable of being mounted between said metal surfaces of said metal susceptor and said plasma, including said planar metal surface and said sidewall metal surface on said metal susceptor, and in contact with said metal surfaces, but not bonded thereto, to thereby protect said planar and sidewall metal surfaces of said metal susceptor from said attack by species in said plasma, while mitigating damage to said protective ceramic surfaces from thermal expansion rate mismatch between said metal surfaces and said ceramic surfaces, said removable ceramic members including a ceramic disk mountable on said planar metal surface of said metal susceptor, and a ceramic collar in peripheral contact with an exposed surface of said ceramic disk, said ceramic collar having a ceramic skirt depending therefrom extending over said sidewall metal surface of said metal susceptor to thereby inhibit contact of said metal surfaces on said metal susceptor by said species generated by said plasma.
Specification