Mild antimicrobial liquid cleansing formulations comprising buffering compound or compounds as potentiator of antimicrobial effectiveness

• US 5,681,802 A
• Filed: 06/01/1994
• Issued: 10/28/1997
• Est. Priority Date: 06/01/1994
• Status: Expired due to Fees

• Current Assignee: Lever Brothers Company, Division Of Conopco, Inc.
• Original Assignee: Lever Brothers Company, Division Of Conopco, Inc.
• Inventors: Ananthapadmanabhan, Kavssery, Vincent, Carol, Villa, Virgilio, Fujiwara, Mitsuko
• Primary Examiner(s): Lieberman, Paul
• Assistant Examiner(s): Douyon, Lorna M.
• Application Number:
  US08/252,298
• Time in Patent Office: 1,245 Days
• Field of Search: 252/106, 252/108, 252/121, 252/551, 252/142, 252/173, 252/DIG. 5, 510/130, 510/131, 510/159, 510/383, 510/405, 510/428, 510/433, 510/488
• US Class Current: 510/130
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 25/30 characterised by the surfactants
• CPC Class Codes: A01N 31/08 Oxygen or sulfur directly attached to an aromatic ring system
• CPC Class Codes: A01N 31/16 with two or more oxygen or sulfur atoms directly attached to the same aromatic ring system
• CPC Class Codes: A01N 37/02 Saturated carboxylic acids or thio analogues thereof; Derivatives thereof
• CPC Class Codes: A01N 37/36 containing at least one carboxylic group or a thio analogue, or a derivative thereof, and a singly bound oxygen or sulfur atom attached to the same carbon skeleton, this oxygen or sulfur atom not being a member of a carboxylic group or of a thio analogue, or of a derivative thereof, e.g. hydroxy-carboxylic acids
• CPC Class Codes: A61K 2800/52 Stabilizers
• CPC Class Codes: A61K 2800/524 Preservatives
• CPC Class Codes: A61K 2800/596 Mixtures of surface active compounds
• CPC Class Codes: A61K 8/36 Carboxylic acids; Salts or anhydrides thereof
• CPC Class Codes: A61K 8/442 substituted by amido group(s)
• CPC Class Codes: A61K 8/466 containing sulfonic acid derivatives; Salts
• CPC Class Codes: A61K 8/8147 Homopolymers or copolymers of acids; Metal or ammonium salts thereof, e.g. crotonic acid, (meth)acrylic acid; Compositions of derivatives of such polymers
• CPC Class Codes: A61P 17/00 Drugs for dermatological disorders
• CPC Class Codes: A61Q 17/005 Antimicrobial preparations
• CPC Class Codes: A61Q 19/10 Washing or bathing preparations
• CPC Class Codes: A61Q 5/02 Preparations for cleaning the hair

Abstract

A liquid skin cleansing composition comprises (1) mild surfactant systems; (2) 0.1 to 10% by wt. of a compound or compounds which buffer the pH of the composition; and (3) 1% to 99% water to potentiate the bactericidal activity. In a second embodiment of the invention, the buffering compound or compounds potentiates antibacterial effect in compositions already containing an antibacterial agent.

Claims

1. A skin cleansing composition consisting essentially of:

(1) 1% to 15% by wt. acyl isethionate;

(2) 1% to 15% by wt. of an anonic surfactant other than acyl isethionate;

(3) 5% to 15% by wt. amphoteric surfactant;

(4) 1% to 5% by wt. of a pH buffering compound which buffers pH of the composition such that pH is less than 5.0 and which compound is hexanoic acid; and

(5) balance water.

2. A composition according to claim 1, wherein pH is from about 2.5 to less than 5.0.

3. A composition according to claim 1, wherein pH is from about 3.0 to less than 5.0.

4. A skin cleansing composition consisting essentially of:

(1) 1% to 15% by wt. acyl isethionate;

(2) 1% to 15% by wt. of an artionic surfactant other than acyl isethionate;

(3) 5% to 15% by wt. amphoteric surfactant;

(4) 1% to 5% by wt. of a pH buffering compound which buffers pH of the composition such that pH is less than 5.0 and which compound is hexanoic acid;

(5) 0.001% to about 5% by wt. of an antibacterial agent; and

(6) balance water.

5. A composition according to claim 4, wherein pH is from about 2.5 to less than 5.0.

6. A composition according to claim 4, wherein pH is from about 3.0 to less than 5.0.