Stage device and pattern transfer system using the same

• US 5,684,856 A
• Filed: 07/15/1994
• Issued: 11/04/1997
• Est. Priority Date: 09/18/1991
• Status: Expired due to Term

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Fukagawa, Youzou, Korenaga, Nobushige, Asano, Toshiya, Itoh, Hirohito, Takahashi, Satoru, Ohishi, Shinji, Iwamoto, Kazunori
• Primary Examiner(s): Wong, Don
• Application Number:
  US08/275,428
• Time in Patent Office: 1,208 Days
• Field of Search: 378/34, 378/208, 250/453.11, 250/442.11
• US Class Current: 378/34
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: G03F 9/7023 Aligning or positioning in direction perpendicular to substrate surface
• CPC Class Codes: H01J 2237/20228 Mechanical X-Y scanning
• CPC Class Codes: H01J 2237/20278 Motorised movement
• CPC Class Codes: H01J 2237/3175 Lithography
• CPC Class Codes: H01J 37/20 Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support introducing the objects H01J37/18

Abstract

A stage device includes a first, fine-motion driving system for moving a movable stage through a first range; and a second, relatively rough-motion driving system for moving the movable stage through a second range which is substantially of the same extent as the first range.

Claims

1. A stage device, comprising:

first, fine-motion driving means, comprising a linear motor, for moving a movable stage through a first range in a predetermined direction; and

second, relatively rough-motion driving means for moving the movable stage through a second range in the predetermined direction, which is substantially of the same extent as the first range.

2. A device according to claim 1, wherein said second driving means comprises a linear motor.

3. A device according to claim 1, wherein said second driving means uses a rotary drive force of a rotary motor.

4. A device according to claim 1, wherein said second driving means uses a gas pressure.

5. A device according to claim 4, wherein said second driving means comprises a gas cylinder and control means for controlling supply of a gas to said gas cylinder.

6. A device according to claim 1, wherein said second driving means and the movable stage are coupled with each other through a resilient member which is deformable with respect to the movement direction.

7. A device according to claim 6, further comprising means for detecting displacement of said resilient member, and control means for moving the movable stage on the basis of an output of said detecting means.

8. A device according to claim 6, further comprising second control means for controlling said second driving means in accordance with an acceleration curve which can be differentiated with respect to time.

9. A device according to claim 1, wherein said second driving means and the movable stage are disengageably coupled with each other through a disengageable clutch.

10. A device according to claim 1, wherein said second driving means and the movable stage are coupled with each other through a joint having a clearance in the movement direction.

11. A device according to claim 1, wherein the movable stage is moved in a direction having a component of gravity.

14. A device according to claim 1, further comprising static pressure bearing means for guiding the movable stage.

15. A device according to claim 2, further comprising static pressure bearing means for guiding the movable stage.

16. An exposure method for manufacturing a semiconductor device, said method comprising the steps of:

providing a stage device as recited in any one of claims 1 through 11;

holding a substrate with the stage device; and

exposing the substrate with radiation energy including one of X-rays and ultraviolet rays.

12. An exposure system including a stage device, comprising:

first, fine-motion driving means, comprising a linear motor, for moving a movable stage through a first range in a predetermined direction;

second, relatively rough-motion driving means for moving the movable stage through a second range in the predetermined direction, which is substantially of the same extent as the first range; and

means for exposing a substrate placed on the movable stage with radiation energy generated by one of an X-ray source and an excimer laser source.

13. A system according to claim 12, wherein the substrate comprises a semiconductor wafer, and a circuit pattern is transferred thereto by said system.