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III-V aresenide-nitride semiconductor materials and devices

  • US 5,689,123 A
  • Filed: 10/01/1996
  • Issued: 11/18/1997
  • Est. Priority Date: 04/07/1994
  • Status: Expired due to Fees
First Claim
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1. A III-V compound semiconductor material having at least nitrogen and arsenic disposed at Group V lattice sites wherein concentration of nitrogen to arsenic in said material is either less than about 5% or greater than about 90% comprising misicible regions for said material when utilizing MOCVD, said nitrogen and arsenic being proportioned at said Group V lattice sites of said material within said concentration so that said material is substantially lattice matched to a semiconductor substrate upon which said material is deposited while providing a direct bandgap level lower than the case where either the nitrogen or the arsenic is absent from the material.

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