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Maskless, reticle-free, lithography

  • US 5,691,541 A
  • Filed: 05/14/1996
  • Issued: 11/25/1997
  • Est. Priority Date: 05/14/1996
  • Status: Expired due to Term
First Claim
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1. A maskless lithography system comprising;

  • a programmable array of binary light switches (PABLS), said programmable array comprising active elements that can be digitally programmed to direct, or not direct, incident light into a fixed pupil location,a pulsed or strobed radiation source that illuminates the programmable array with a sequence of pulses,a projection system that images the array pattern onto a substrate, anda scanning substrate stage that is in motion during the sequence of pulses but which moves only a small fraction of a minimum feature size during the time duration of a single pulse.

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