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Compound semiconductor device with nitride

  • US 5,693,963 A
  • Filed: 09/11/1995
  • Issued: 12/02/1997
  • Est. Priority Date: 09/19/1994
  • Status: Expired due to Term
First Claim
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1. A compound semiconductor device comprising:

  • a crystal substrate; and

    a first semiconductor film composed of an n-type nitride compound supported by said substrate and formed through vapor phase growth,wherein said first semiconductor film contains at least one of 1×

    1015 cm-3 to 1×

    1017 cm-3 of magnesium and 1×

    1015 cm-3 -1×

    1017 cm-3 of zinc so as to improve a shift from its three-dimensional growth to its two-dimensional growth.

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