Process for fabricating a semiconductor integrated circuit device
First Claim
1. A method of manufacturing a memory cell of a static random access memory, said memory cell including a driver MISFET and a capacitor element, said capacitor element having a first electrode, a second electrode, and a dielectric film between said first and said second electrode, said driver MISFET having a gate electrode serving as said first electrode of said capacitor element, said method comprising the steps of:
- forming a polycrystalline silicon film over a semiconductor substrate by depositing the polycrystalline silicon film by a CVD method and doping the polycrystalline film with an impurity during the deposition to decrease the resistance and the surface roughness of said polycrystalline silicon film,wherein said first electrode is formed of said polycrystalline silicon film,wherein said second electrode is formed over an upper surface of said polycrystalline silicon film,wherein said dielectric film is formed between said upper surface of said polycrystalline silicon film and a lower surface of said second electrode, andwherein dielectric strength of the dielectric film is improved due to the reduced surface roughness of the polycrystalline silicon film.
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Abstract
A method is provided for manufacturing a semiconductor integrated circuit device which includes a capacitor element having a first electrode, a second electrode, and a dielectric film formed between said first electrode and said second electrode. In particular, the method includes the step of forming at least one of the first electrode and second electrode with a polycrystalline silicon film which is deposited over a semiconductor substrate by a CVD method and which is doped with an impurity during said deposition to decrease the resistance of the polycrystalline silicon film. The capacitor element formed by this method is particularly useful for memory cells of static random access memory devices.
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Citations
25 Claims
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1. A method of manufacturing a memory cell of a static random access memory, said memory cell including a driver MISFET and a capacitor element, said capacitor element having a first electrode, a second electrode, and a dielectric film between said first and said second electrode, said driver MISFET having a gate electrode serving as said first electrode of said capacitor element, said method comprising the steps of:
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forming a polycrystalline silicon film over a semiconductor substrate by depositing the polycrystalline silicon film by a CVD method and doping the polycrystalline film with an impurity during the deposition to decrease the resistance and the surface roughness of said polycrystalline silicon film, wherein said first electrode is formed of said polycrystalline silicon film, wherein said second electrode is formed over an upper surface of said polycrystalline silicon film, wherein said dielectric film is formed between said upper surface of said polycrystalline silicon film and a lower surface of said second electrode, and wherein dielectric strength of the dielectric film is improved due to the reduced surface roughness of the polycrystalline silicon film. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of manufacturing a semiconductor integrated circuit device, said semiconductor integrated circuit device comprising a memory cell including a first inverter circuit, a second inverter circuit, a first capacitor element, and a second capacitor element,
said first inverter circuit including a first driver MISFET and a first load element coupled in series, said second inverter circuit including a second driver MISFET and a second load element coupled in series, each of said first and said second capacitor elements including a first electrode, a second electrode, and a dielectric film formed between said first electrode and said second electrode, said first electrode of said first capacitor element electrically connected to a drain region of said first driver MISFET and a gate electrode of said second driver MISFET, said first electrode of said second capacitor element electrically connected to a drain region of said second driver MISFET and a gate electrode of said first driver MISFET, said method comprising the step of: -
forming one of said first electrode and said second electrode of said capacitor element by a polycrystalline silicon film by depositing the polycrystalline silicon film over a semiconductor substrate by a CVD method and doping the polycrystalline silicon film with an impurity during said deposition to decrease the resistance and the surface roughness of said polycrystalline silicon film, and forming the other of said first electrode and said second electrode of said capacitor element over said semiconductor substrate by deposition; wherein said dielectric film of said capacitor element is formed between a surface of said polycrystalline silicon film and a surface of said second electrode; and wherein dielectric strength of the dielectric film is improved by the reduced surface roughness of the polycrystalline silicon film. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification