Process for laser scribing a pattern in a planar laminate
First Claim
1. A process for laser scribing a pattern in a planar laminate having at least one overlying layer and at least one underlying layer, comprising:
- applying a focused laser beam to an area of the pattern to be ablated on the overlying layer side of the laminate, said laser beam having a wavelength which is substantially unabsorbed by the overlaying layer but which is absorbed by the underlying layer, such that at least a portion of the underlying layer is directly ablated and the overlying layer is indirectly ablated throughout its thickness in the area of the pattern to be ablated.
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Abstract
An improved dielectric layer of an electroluminescent laminate, and method of preparation are provided. The dielectric layer is formed as a thick layer from a ceramic material to provide:
a dielectric strength greater than about 1.0×106 V/m;
a dielectric constant such that the ratio of the dielectric constant of the dielectric material to that of the phosphor layer is greater than about 50:1;
a thickness such that the ratio of the thickness of the dielectric layer to that of the phosphor layer is in the range of about 20:1 to 500:1; and
a surface adjacent the phosphor layer which is compatible with the phosphor layer and sufficiently smooth that the phosphor layer illuminates generally uniformly at a given excitation voltage.
The invention also provides for electrical connection of an electroluminescent laminate to voltage driving circuity with through hole technology. The invention also extends to laser scribing the transparent conductor lines of an electroluminescent laminate.
146 Citations
16 Claims
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1. A process for laser scribing a pattern in a planar laminate having at least one overlying layer and at least one underlying layer, comprising:
applying a focused laser beam to an area of the pattern to be ablated on the overlying layer side of the laminate, said laser beam having a wavelength which is substantially unabsorbed by the overlaying layer but which is absorbed by the underlying layer, such that at least a portion of the underlying layer is directly ablated and the overlying layer is indirectly ablated throughout its thickness in the area of the pattern to be ablated. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A process for laser scribing an electrode pattern in an EL laminate having a phosphor layer sandwiched between a front and rear set of intersecting address lines, the rear address lines being formed on a rear substrate, the phosphor layer being separated from the rear address lines by one or more dielectric layers, and the front address lines being formed from a transparent conductive material, the process comprising:
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applying a focused laser beam to an area of pattern to be ablated in the transparent conductive material, said laser beam having a wavelength which is substantially unabsorbed by the transparent conductive material but which is absorbed by the one or more dielectric layers or the phosphor layer, such that the phosphor layer is directly ablated throughout its thickness, a portion of the one or more dielectric layers is directly ablated and the transparent conductive material is indirectly ablated throughout its thickness, the ablation being in the area of the pattern to be ablated; forming the electrode pattern by moving one or both of the laminate and the laser beam relative to each to other in the electrode pattern; and wherein the dielectric layer comprises; a planar layer formed from a sintered ceramic material such that the dielectric layer provides a dielectric strength greater than about 1.0×
106 V/m and a dielectric constant such that the ratio of the dielectric constant of the dielectric material to that of the phosphor is greater than about 50;
1, the dielectric layer having a thickness such that the ratio of the thickness of the dielectric layer to that of the phosphor layer is in the range of about 20;
1 to 500;
1, and the dielectric layer having a surface adjacent the phosphor layer which is sufficiently smooth that the phosphor layer illuminates generally uniformly at a given excitation voltage. - View Dependent Claims (12, 13, 14, 15, 16)
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Specification