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Plasma reactor using UHF/VHF and RF triode source, and process

  • US 5,707,486 A
  • Filed: 07/16/1996
  • Issued: 01/13/1998
  • Est. Priority Date: 07/31/1990
  • Status: Expired due to Fees
First Claim
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1. A system for processing a workpiece comprising:

  • a vacuum processing chamber for the workpiece;

    a chamber inlet for introducing process gas into the chamber;

    a plurality of electrodes coupling AC electrical energy into the chamber to generate a plasma in the gas, the electrodes comprising a first electrode structure having two separate sections for defining a plasma-generating electrical field, the field being concentrated within a region of the chamber spaced from the workpiece, the field also being principally oriented parallel to the workpiece for preventing ion acceleration from or toward the workpiece, and a second electrode structure adapted to support the workpiece and for modifying a sheath voltage associated with the electrodes and plasma ion energy proximate the workpiece;

    first source of AC electrical energy to the first electrode at a first frequency within the range of about 50 MHz to about 800 MHz, anda second source of AC electrical energy to the second electrode at a second frequency within the range of about 0.1 MHz up to but below about 50 MHz, thereby controlling the sheath voltage and the plasma ion energy.

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