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Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns

  • US 5,715,039 A
  • Filed: 05/17/1996
  • Issued: 02/03/1998
  • Est. Priority Date: 05/19/1995
  • Status: Expired due to Fees
First Claim
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1. A projection exposure method for forming patterns on a substrate comprising:

  • a) applying light of wavelength (λ

    ) emitted from a light source, onto a mask having a pattern, through illumination optics;

    b) imaging the pattern on the mask onto the substrate utilizing projection optics with a reduction ratio of M;

    1 and a numerical aperture of NA; and

    c) forming an image of the mask pattern, by means of light diffracted by a first grating, positioned between the substrate and the projection optics, parallel to the substrate, interfering on a nearby substrate surface.

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