Method and apparatus for producing integrated circuit devices
First Claim
Patent Images
1. A method for three dimensional lithography including the steps of:
- providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and
illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
7 Assignments
0 Petitions
Accused Products
Abstract
A method for three dimensional lithography including the steps of providing a substrate (44) having surfaces extending in three dimensions and a light sensitive coating and illuminating the substrate via a mask (40) with light impinging on the surfaces at a non-perpendicular angle with respect thereto.
185 Citations
26 Claims
-
1. A method for three dimensional lithography including the steps of:
-
providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 26)
-
-
16. A method for three dimensional lithography including the steps of:
-
providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask non-perpendicularly there-through with light impinging on at least two non-mutually parallel surfaces of said substrate.
-
-
17. A method for photolithographic forming of metal areas on an integrated circuit device including the steps of:
-
providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
-
-
18. A method for photolithographic forming of metal areas on an integrated circuit device including the steps of:
-
providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said integrated circuit device via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
-
-
19. Apparatus for three dimensional lithography including:
an illuminator for illuminating a substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask. - View Dependent Claims (20, 21, 22, 23, 25)
-
24. Apparatus for photolithographic forming of metal areas on an integrated circuit device including:
an illuminator for illuminating an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Specification