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Method and apparatus for locating patterns in an optical image

  • US 5,717,785 A
  • Filed: 05/09/1994
  • Issued: 02/10/1998
  • Est. Priority Date: 01/30/1992
  • Status: Expired due to Term
First Claim
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1. An apparatus for identifying a linear pattern, having an expected radius less than or equal to a value r, in an image signal, I, said apparatus comprising:

  • A. projection means for generating a projection signal, P, representative of a projection of said image signal along an axis substantially aligned with an expected orientation of said linear pattern, where said projection signal, P, is comprised of elements Pi, where i is an integer between 1 and a length of said image signal along said axis,B. mirror symmetry filter means, coupled with said projection means, responsive to said radius and said projection signal for filtering that projection signal to generate a mirror symmetry signal, S, representative of the degree of symmetry of the projection signal P about each point therein,wherein said mirror symmetry filter means includes means for filtering said projection signal P to generate two mirror symmetry signals, S1 and S2, wherein each signal S1, S2 is representative of the degree of symmetry of the projection signal P about each point therein, and wherein each signal S1, S2 is out of phase with the other,C. notch detection means, coupled with said mirror symmetry filter means, for operating on said mirror symmetry signal with a selected mask to generate a peak location signal emphasizing a peak in said mirror symmetry signal corresponding to a location of a center of said linear pattern, andD. peak locating means, coupled with said notch detection means, for identifying a peak in said peak location signal, and for estimating from a location of that peak a location of a center of said linear pattern.

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