Method for making photomasks having regions of different light transmissivities

• US 5,718,991 A
• Filed: 12/27/1996
• Issued: 02/17/1998
• Est. Priority Date: 12/27/1996
• Status: Expired due to Term

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Lin, Dhei-Jhai, Cheng, Wen-Tung, Lee, Rong-Jer, Cheng, Hua-Chi
• Primary Examiner(s): Rosasco, S.
• Application Number:
  US08/773,829
• Time in Patent Office: 417 Days
• Field of Search: 430/5, 430/7, 430/322, 430/324
• US Class Current: 430/5
• CPC Class Codes: G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

An improved method for preparing multiple-exposure photomasks having at least three levels of transmissivity is disclosed. A conventional bi-exposure photomask is first formed which contains a macroscopically exposed area, a microscopically exposed area, and a masked area on a transparent substrate. Then a diffractive-refractive light-scattering optical element is formed above the microscopically exposed area so as to provide an exposure area with an intermediate light transmissivity. In a preferred embodiment, the diffractive-refractive light-scattering optical element above the microscopically exposed area is formed by first forming a transparent positive photoresist above the bi-exposure photomask. The transparent positive photoresist is exposed to an irradiation from the bottom of the transparent substrate, and is developed. Finally, the transparent positive photoresist is heated to cause a melt-flow thereof which forms a concave optical element above the microscopically exposed area. The transmissivity of the intermediate exposure area can be adjusted by adjusting the dimensions of the microscopical openings provided therein and the distance between the microscopic openings. More than one microscopic pattern can be provided on the same substrate so as to allow two or more intermediate transmissitivities to be obtained.

Claims

1. A method for preparing multiple-exposure photomasks having at least three levels of transmissivity comprising the steps of:

(a) forming a hi-exposure photomask containing a microscopically exposed area and a masked area on a transparent substrate, wherein said microscopically exposed area comprises a plurality of through holes surrounded by a portion of said masked area; and

(b) forming a refractive light-scattering optical element above said microscopically exposed area so as to cause a light ray through said microscopically exposed area to be uniformly distributed.

2. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 1 wherein said step of forming said refractive light-scattering optical element above said microscopically exposed area comprises the steps of:

(a) forming a transparent positive photoresist above said bi-exposure photomask covering said said microscopically exposed area and said masked area;

(b) exposing said transparent positive photoresist to an irradiation from a bottom of said transparent substrate;

(c) developing said exposed transparent positive photoresist; and

(d) heating said transparent positive photoresist to cause a melt-flow thereof such that a concave refractive optical element is formed above said microscopically exposed area.

3. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 2 wherein said steps of exposing and developing said transparent positive photoresist are conducted such that said microscopically exposed area becomes fully exposed after said developing step.

4. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 2 wherein said steps of exposing and developing said transparent positive photoresist are conducted such that said a portion of said transparent positive photoresist still remains above said microscopically exposed area after said developing step.

5. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 1 wherein said step of forming said refractive light-scattering optical element above said microscopically exposed area comprises the steps of:

(a) forming a transparent positive photoresist above said bi-exposure photomask covering said microscopically exposed area and said masked area;

(b) exposing said transparent positive photoresist to irradiation from a bottom of said transparent substrate;

(c) developing said exposed transparent positive photoresist;

(d) forming a layer of a viscous transparent material on said transparent positive photoresist; and

(e) allowing said viscous transparent material to flow over said microscopically exposed area and drying said viscous transparent material so as to form a concave refractive optical element from said viscous transparent material above said microscopically exposed area.

6. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 5 wherein said transparent positive photoresist is heated to cause a melt-flow thereof after development.

7. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 1 which further comprises the steps of:

(a) forming an opaque negative photoresist on another transparent substrate;

(b) transforming a pattern of said bi-exposure photomask into said opaque negative photoresist provided on another transparent substrate by light irradiation and development;

(c) forming a layer of a viscous transparent material on said opaque negative photoresist having the same pattern as said bi-exposure photomask; and

(d) allowing said viscous transparent material to flow over said microscopically exposed area and drying said viscous transparent material so as to form a refractive concave optical element from said viscous transparent material above said microscopically exposed area.

8. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 1 wherein said through holes are provided having a texture selected from the group consisting of stripes, grid, dot matrix, and combinations thereof.

9. The method for preparing multiple-exposure photomasks having at least three levels of transmissivity according to claim 1 which contains two said microscopically exposed areas with different sized through holes and different levels of light transmissivity.

10. A multiple-exposure photomask having at least three levels of transmissivity comprising:

(a) a masked area for low light transmissivity and an area of partial light transmissivity, formed on a transparent substrate;

(b) wherein said partial light transmissivity area comprises a refractive light-scattering optical element formed above a microscopically exposed area, which comprises a plurality of through holes surrounded by a portion of said masked area.

11. The multiple-exposure photomask having at least three levels of transmissivity according to claim 10 wherein said refractive light-scattering optical element is formed above said microscopically exposed area using a process which comprises the steps of:

(a) forming a bi-exposure photomask containing said microscopically exposed area and said masked area on said transparent substrate; and

(b) forming said refractive light-scattering optical element above said microscopically exposed area so as to form an exposure area with a partial light transmissivity.

12. The multiple-exposure photomask having at least three levels of transmissivity according to claim 11 wherein said step of forming said refractive light-scattering optical element above said microscopically exposed area comprises the steps of:

(a) forming a transparent positive photoresist above said bi-exposure photomask covering said microscopically exposed area and said masked area;

(b) exposing said transparent positive photoresist from a bottom of said transparent substrate;

(c) developing said exposed transparent positive photoresist; and

(d) heating said transparent positive photoresist to cause a melt-flow thereof such that a concave optical element is formed above said microscopically exposed area.

13. The multiple-exposure photomask having at least three levels of transmissivity according to claim 12 wherein said steps of exposing and developing said transparent positive photoresist are conducted such that said microscopically exposed area becomes fully exposed after said developing step.

14. The multiple-exposure photomask having at least three levels of transmissivity according to claim 12 wherein said steps of exposing and developing said transparent positive photoresist are conducted such that said a portion of said transparent positive photoresist still remains above said microscopically exposed area after said developing step.

15. The multiple-exposure photomask having at least three levels of transmissivity according to claim 11 wherein said step of forming said refractive light-scattering optical element above said microscopically exposed area comprises the steps of:

(a) forming a transparent positive photoresist above said bi-exposure photomask coveting said microscopically exposed area and said masked area;

(b) exposing said transparent positive photoresist from a bottom of said transparent substrate;

(c) developing said exposed transparent positive photoresist;

(d) forming a layer of a viscous transparent material on said transparent positive photoresist; and

(e) allowing said viscous transparent material to flow over said microscopically exposed area and drying said viscous transparent material so as to form a concave optical element from said viscous transparent material above said microscopically exposed area.

16. The multiple-exposure photomask having at least three levels of transmissivity according to claim 15 wherein said viscous transparent material contains an aqueous solution of polyvinylpyrrolidone and a small amount of a surface active agent.

17. The multiple-exposure photomask having at least three levels of transmissivity according to claim 16 wherein said transparent positive photoresist is heated to cause a melt-flow thereof after development, and said viscous transparent material contains an aqueous solution of polymethylmethacrylate.

18. The multiple-exposure photomask having at least three levels of transmissivity according to claim 11 wherein said process of forming said refractive light-scattering optical element further comprises the steps of:

(a) forming an opaque negative photoresist on another transparent substrate;

(b) transforming a pattern of said bi-exposure photomask into said opaque negative photoresist provided on another transparent substrate by light irradiation and development;

(c) forming a layer of a viscous transparent material on said opaque negative photoresist having the same pattern as said bi-exposure photomask; and

(d) allowing said viscous transparent material to flow over said microscopically exposed area and drying said viscous transparent material so as to form a refractive concave optical element from said viscous transparent material above said microscopically exposed area.

19. The multiple-exposure photomask having at least three levels of transmissivity according to claim 11 wherein said through holes in said microscopically exposed area have a texture selected from the group consisting of stripes, grid, dot matrix, and combinations thereof.

20. A method for making color filters including the steps of exposing a photoresist to a light irradiation via a multiple-exposure photomasks wherein said multiple-exposure photomasks comprises:

(a) a masked area for low light transmissivity and an area of partial light transmissivity, formed on a transparent substrate;

(b) further wherein said partial light transmissivity area comprises a refractive light scattering optical element formed above a microscopically exposed area, which comprises a plurality of through holes surrounded by a portion of said masked area.