Process for analyzing analytes using HF-resistant ultrasonic nebulizer components

• US 5,719,062 A
• Filed: 04/16/1996
• Issued: 02/17/1998
• Est. Priority Date: 06/06/1995
• Status: Expired due to Fees

• Current Assignee: Saint Gobain Industrial Ceramics, Inc. (Compagnie de Saint-Gobain SA)
• Original Assignee: Saint Gobain Industrial Ceramics, Inc. (Compagnie de Saint-Gobain SA)
• Inventors: Kinisky, Thomas G.
• Primary Examiner(s): Pyon, Harold Y.
• Application Number:
  US08/633,196
• Time in Patent Office: 672 Days
• Field of Search: 436/183, 239/102.2, 423/446, 106/14.05, 204/192.15, 505/401, 427/248.1
• US Class Current: 436/183
• CPC Class Codes: G01N 1/22 in the gaseous state specially adapted for biological material G01N33/497; measuring breath flow A61B5/087
• CPC Class Codes: G01N 21/714 Sample nebulisers for flame burners or plasma burners nebulizers per se B05B

Abstract

A process for analyzing analytes using nebulizer component selected from the group consisting of a desolvation tube, a condenser tube, an aerosol-generator and a transducer, wherein the component has a contact surface selected from the group consisting of CVD silicon carbide, CVD diamond film and glassy carbon.

Claims

1. A process for analyzing analytes comprising the steps of:

a) contacting a solution with a contact surface consisting of CVD silicon carbide, wherein the contact occurs for between 1 and 10 minutes and adds less than 1000 ppm impurities to the solution, and wherein the solution has a temperature of at least 100°

C. and comprises;

i) an analyte, and

ii) a solvent having at least 1 v/o HF of an acid selected from the group consisting of HF and an acid having a pKA of less than one, and

b) determining the concentration of the analyte.

2. The process of claim 1 wherein the solvent contains at least 10 v/o HF.

3. The process of claim 2 wherein the solvent contains about 30 v/o HF.

4. The process of claim 1 wherein the temperature of the solution is between about 100°

C. and 175°

C.

5. The process of claim 4 wherein contact adds less than 1000 ppm impurities to the solution.

6. The process of claim 5 wherein the solvent comprises at least 10 v/o HF.

7. The process of claim 5 wherein the solvent comprises about 30 v/o HF.