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Optical proximity correction method and apparatus

  • US 5,723,233 A
  • Filed: 02/27/1996
  • Issued: 03/03/1998
  • Est. Priority Date: 02/27/1996
  • Status: Expired due to Term
First Claim
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1. An optical proximity correction method for preparing reticle designs to be used in photolithography, the method comprising the following steps:

  • (a) performing pattern recognition on an integrated circuit layout design to identify a location of a selected feature edge in the layout design;

    (b) obtaining an optical proximity correction value for said selected feature edge by evaluating one or more non-linear mathematical expressions for optical proximity correction at the location of the selected feature edge, the one or more non-linear mathematical expression defining a curve that non-linearly increases an amount of optical proximity correction for said selected feature edge; and

    (c) incorporating said optical proximity correction value into said layout design to form said reticle design.

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