Dishing and erosion monitor structure for damascene metal processing
First Claim
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1. A monitor for characterizing the dishing occurring in a planarization process comprising:
- a) a wafer;
b) a first monitor structure set embedded in said wafer, said first monitor structure set comprising a first plurality of monitor structures, said first plurality of monitor structures connected together in series with a first plurality of connective traces; and
c) a second monitor structure set embedded in said wafer, said second monitor structure set comprising a second plurality of monitor structures, said second plurality of monitor structures having an area less than said first plurality of monitor structures and connected together in series with a second plurality of connective traces.
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Abstract
According to the preferred embodiment, an erosion and dishing monitor is provided that facilitates the accurate optimization of a planarization process as in semiconductor process. The dishing monitor comprises at least two monitor structure sets embedded in a semiconductor substrate, the monitor structure sets comprising a plurality of monitor structures connected together with a plurality of connective conductors. The erosion monitor comprises a plurality of elongated conductors embedded into a semiconductor substrate, the plurality of conductors having varying conductor widths and adjacent substrate widths.
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Citations
17 Claims
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1. A monitor for characterizing the dishing occurring in a planarization process comprising:
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a) a wafer; b) a first monitor structure set embedded in said wafer, said first monitor structure set comprising a first plurality of monitor structures, said first plurality of monitor structures connected together in series with a first plurality of connective traces; and c) a second monitor structure set embedded in said wafer, said second monitor structure set comprising a second plurality of monitor structures, said second plurality of monitor structures having an area less than said first plurality of monitor structures and connected together in series with a second plurality of connective traces. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A monitor for characterizing the erosion of a planarization process comprising:
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a) a wafer; b) a first erosion monitor embedded in said wafer, said first erosion monitor comprising at least one elongated conductor, said elongated conductor having a first predetermined width and a first width of adjacent portions of the wafer; c) a second erosion monitor embedded in said wafer, said second erosion monitor comprising at least one elongated conductor, said elongated conductor having a second predetermined width and a second width of adjacent portions of the wafer. - View Dependent Claims (11, 12, 13)
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14. A monitor for characterizing the dishing of a planarization process comprising:
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a wafer including a plurality of recessed regions in the surface of the wafer, said recessed regions comprising a first plurality of substantially identical rectangular subregions having a predetermined length to width ration of between about 0.20;
1 and 5;
1, each first subregion being connected to at least one other first subregion by a plurality of connective channels;said recessed regions further comprising a second plurality of subregions, each second subregion having a predetermined length to width ration equal to that of the first subregions and being of a smaller area than said first subregions and each second subregion being connected to at least one other second subregion by a plurality of conductive channels. - View Dependent Claims (15)
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16. A monitor for characterizing the erosion of a planarization process comprising:
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a wafer including a plurality of recessed regions in the surface of the wafer, said recessed regions comprising a first subset of elongated recessed regions forming a first predetermined area percentage of recessed to non-recessed surface; said recessed regions further comprising a second subset of elongated recessed regions having a different predetermined percentage of recessed to non-recessed surface. - View Dependent Claims (17)
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Specification