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Projection exposure apparatus and device manufacturing method using the same

  • US 5,726,739 A
  • Filed: 10/25/1994
  • Issued: 03/10/1998
  • Est. Priority Date: 10/27/1993
  • Status: Expired due to Term
First Claim
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1. A projection exposure apparatus comprising:

  • secondary light source forming means having a light entrance surface and a light exit surface, for receiving light from a light source with the light entrance surface and for forming a secondary light source at the light exit surface side;

    light projecting means for projecting light from said secondary light source to an object plane;

    pattern projecting means for projecting, onto an image plane, a pattern on the object plane irradiated with the light;

    secondary light source adjusting means for changing a light intensity distribution of said secondary light source; and

    illuminance correcting means for changing an intensity distribution of light from the light source, upon the light entrance surface of said secondary light source forming means, to correct an illuminance distribution, to be formed on the image plane asymmetrically with respect to a center due to a variation in light intensity distribution of said secondary light source, into an illuminance distribution symmetric with respect to the center.

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