Projection exposure apparatus and device manufacturing method using the same

• US 5,726,739 A
• Filed: 10/25/1994
• Issued: 03/10/1998
• Est. Priority Date: 10/27/1993
• Status: Expired due to Term

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Hayata, Shigeru
• Primary Examiner(s): Moses, R. L
• Assistant Examiner(s): VIRMANI, SHIVAL P
• Application Number:
  US08/329,072
• Time in Patent Office: 1,232 Days
• Field of Search: 355/53, 355/67, 355/77, 355/69, 250/201.1, 359/618, 359/619, 359/638-640, 356/399, 356/400, 356/401
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70066 Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• CPC Class Codes: G03F 7/701 Off-axis setting using an aperture
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091

Abstract

A projection exposure apparatus includes a secondary light source forming device having a light entrance surface and a light exit surface, for receiving light from a light source with the light entrance surface and for forming a secondary light source at the light exit surface side, a light projecting system for projecting light from the secondary light source to an object plane, a pattern projecting system for projecting, onto an image plane, a pattern on the object plane irradiated with the light, a secondary light source adjusting device for changing a light intensity distribution of the secondary light source, and an illuminance correcting device for substantially correcting illuminance non-uniformness, asymmetric with respect to an optical axis, formed or to be formed on the image plane with the change of the light intensity distribution.

Claims

1. A projection exposure apparatus comprising:

secondary light source forming means having a light entrance surface and a light exit surface, for receiving light from a light source with the light entrance surface and for forming a secondary light source at the light exit surface side;

light projecting means for projecting light from said secondary light source to an object plane;

pattern projecting means for projecting, onto an image plane, a pattern on the object plane irradiated with the light;

secondary light source adjusting means for changing a light intensity distribution of said secondary light source; and

illuminance correcting means for changing an intensity distribution of light from the light source, upon the light entrance surface of said secondary light source forming means, to correct an illuminance distribution, to be formed on the image plane asymmetrically with respect to a center due to a variation in light intensity distribution of said secondary light source, into an illuminance distribution symmetric with respect to the center.

2. An apparatus according to claim 1, wherein said illuminance correcting means comprises means for adjusting an intensity distribution of light from the light source, upon a light entrance surface of said secondary light source forming means.

3. An apparatus according to claim 2, further comprising light source image projecting means for projecting an image of the light source upon the light entrance surface of said secondary light source forming means, wherein said illuminance correcting means comprises light source image displacing means for changing the position of the light source image on the light entrance surface.

4. An apparatus according to claim 3, wherein said light source image displacing means comprises light source position adjusting means for changing the position of the light source on a plane perpendicular to an optical axis.

5. An apparatus according to claim 4, wherein said light source image displacing means comprises light deflecting means for deflecting the light from the light source in a direction perpendicular to the optical axis.

6. An apparatus according to claim 5, wherein said light deflecting means comprises one of an elliptical mirror for reflecting the light from the light source, a movable lens and a transparent plate each for refracting the light from the light source.

7. An apparatus according to claim 6, wherein said transparent plate comprises a plurality of wedge-like plate members.

8. An apparatus according to claim 1, wherein the light source comprises one of a lamp and a laser.

9. An apparatus according to claim 1, wherein said secondary light source forming means comprises a fly'"'"'s-eye lens.

10. An apparatus according to claim 1, wherein said secondary light source adjusting means comprises an aperture stop having a variable aperture shape.

11. An apparatus according to claim 3, wherein said secondary light source adjusting means comprises a variable-magnification optical system for changing the size of the light source image.

12. An apparatus according to claim 1, wherein said secondary light source adjusting means comprises a light deflecting member for changing the position of incidence of the light from the light source upon a light entrance surface of said secondary light source forming means.

13. An apparatus according to claim 1, wherein said pattern projecting means comprises a projection lens.

14. An apparatus according to claim 1, wherein said pattern projecting means comprises a projection mirror.

15. An apparatus according to claim 1, wherein said illuminance correcting means comprises means for substantively increasing the quantity of light to be projected to the object plane, which quantity is reduced as a result of a change in the light intensity distribution.

16. An apparatus according to claim 1, wherein said illuminance correcting means comprises illuminance detecting means for detecting an illuminance distribution on at least one of the image plane and the object plane.

17. An apparatus according to claim 1, wherein said illuminance correcting means further comprises means for substantively correcting illuminance non-uniformness produced on the image plane due to a change in the light intensity distribution.

18. A projection exposure apparatus, comprising:

light source image projecting means for projecting an image of a light source;

secondary light source forming means having a light entrance surface and a light exit surface, for forming a secondary light source at the light exit surface thereof in response to projection of the light source image on the light entrance surface thereof;

light projecting means for projecting light from said secondary light source onto an object plane;

pattern projecting means for projecting an image of a pattern, placed on the object plane and irradiated with the light, onto an image plane; and

secondary light source adjusting means for changing light intensity distribution of said secondary light source,

wherein said light source image projecting means comprises illuminance adjusting means for changing the position of the light source image with respect to a direction of an optical axis, so as to reduce a decrease in a quantity of light from said secondary light source caused by a variation in the light intensity distribution of said secondary light source.

19. An apparatus according to claim 18, wherein said illuminance adjusting means comprises means for adjusting an intensity distribution of light from the light source, upon a light entrance surface of said secondary light source forming means.

20. An apparatus according to claim 19, further comprising light source image projecting means for projecting an image of the light source upon the light entrance surface of said secondary light source forming means, wherein said illuminance adjusting means comprises light source image displacing means for changing the position of the light source image on the light entrance surface.

21. An apparatus according to claim 20, wherein said light source image displacing means comprises light source position adjusting means for changing the position of the light source on a plane perpendicular to an optical axis.

22. An apparatus according to claim 20, wherein said light source image displacing means comprises light deflecting means for displacing the light source image in a direction of the optical axis.

23. An apparatus according to claim 22, wherein said light deflecting means comprises one of an elliptical mirror for reflecting the light from the light source, a movable lens and a transparent plate each for refracting the light from the light source.

24. An apparatus according to claim 23, wherein said transparent plate comprises a plurality of wedge-like plate members.

25. An apparatus according to claim 18, wherein the light source comprises one of a lamp and a laser.

26. An apparatus according to claim 18, wherein said secondary light source forming means comprises a fly'"'"'s-eye lens.

27. An apparatus according to claim 18, wherein said secondary light source adjusting means comprises an aperture stop having a variable aperture shape.

28. An apparatus according to claim 20, wherein said secondary light source adjusting means comprises a variable-magnification optical system for changing the size of the light source image.

29. An apparatus according to claim 18, wherein said pattern projecting means comprises a projection lens.

30. An apparatus according to claim 18, wherein said pattern projecting means comprises a projection mirror.

31. An apparatus according to claim 18, wherein said illuminance adjusting means comprises illuminance detecting means for detecting an illuminance distribution on at least one of the image plane and the object plane.

32. An apparatus according to claim 18, wherein said illuminance correcting means comprises means for substantively correcting illuminance non-uniformness produced on the image plane due to a change in the light intensity distribution.

33. A projection exposure apparatus, comprising:

light source image projecting means for projecting an image of a light source;

secondary light source forming means having a light entrance surface and a light exit surface, for forming a secondary light source on the light exit surface thereof in response to projection of the light source image on the light entrance surface thereof;

light projecting means for projecting light from said secondary light source onto an object plane;

pattern projecting means for projecting an image of a pattern, placed on the object plane and irradiated with the light, onto an image plane; and

secondary light source adjusting means for changing light intensity distribution of said secondary light source,

wherein said light source image projecting means comprises illumination adjusting means for changing an intensity distribution of light upon the light entrance surface of said secondary light source forming means, to correct an illuminance distribution, to be formed on the image plane asymmetrically with respect to a center due to a variation in the light intensity distribution of said secondary light source, into an illuminance distribution symmetric with respect to the center, and also for changing the position of the light source image with respect to a direction of an optical axis, so as to reduce a decrease in a quantity of light from said secondary light source caused by a variation in the light intensity distribution of said secondary light source.

34. An apparatus according to claim 33, further comprising light source image projecting means for projecting an image of the light source upon the light entrance surface of said secondary light source forming means, wherein said illuminance adjusting means comprises light source image displacing means for changing the position of the light source image in a direction along an optical axis and in a direction perpendicular to the optical axis.

35. An apparatus according to claim 34, wherein said light source image displacing means comprises light deflecting means for moving the light source in a direction along the optical axis and in a direction perpendicular to the optical axis.

36. An apparatus according to claim 34, wherein said light source image displacing means comprises light deflecting means for displacing the light source image in a direction along the optical axis and in a direction perpendicular to the optical axis.

37. An apparatus according to claim 36, wherein said light deflecting means comprises one of an elliptical mirror for reflecting the light from the light source, a movable lens and a transparent plate each for refracting the light from the light source.

38. An apparatus according to claim 37, wherein said transparent plate comprises a plurality of wedge-like plate members.

39. An apparatus according to claim 33, wherein the light source comprises one of a lamp and a laser.

40. An apparatus according to claim 33, wherein said secondary light source forming means comprises a fly'"'"'s-eye lens.

41. An apparatus according to claim 33, wherein said secondary light source adjusting means comprises an aperture stop having a variable aperture shape.

42. An apparatus according to claim 33, wherein said secondary light source adjusting means comprises a variable-magnification optical system for changing the size of the light source image.

43. An apparatus according to claim 33, wherein said pattern projecting means comprises a projection lens.

44. An apparatus according to claim 33, wherein said pattern projecting means comprises a projection mirror.

45. An apparatus according to claim 33, wherein said illuminance adjusting means comprises illuminance detecting means for detecting an illuminance distribution on at least one of the image plane and the object plane.

46. An apparatus according to claim 33, wherein said illuminance correcting means comprises means for substantively correcting illuminance non-uniformness produced on the image plane due to a change in the light intensity distribution.

47. A device manufacturing method comprising:

projecting and transferring a device pattern of a reticle onto a substrate using a projection exposure apparatus, comprising;

secondary light source forming means having a light entrance surface and a light exit surface, for receiving light from a light source with the light entrance surface and for forming a secondary light source at the light exit surface side;

light projecting means for projecting light from the secondary light source to an object plane;

pattern projecting means for projecting, onto an image plane, a pattern on the object plane irradiated with the light;

secondary light source adjusting means for changing a light intensity distribution of the secondary light source; and

illuminance correcting means for changing an intensity distribution of light from the light source, upon the light entrance surface of the secondary light source forming means, to correct an illuminance distribution, to be formed on the image plane asymmetrically with respect to a center due to a variation in light intensity distribution of the secondary light source, into an illuminance distribution symmetric with respect to the center.

48. A device manufacturing method comprising:

projecting and transferring a device pattern of a reticle onto a substrate using a projection exposure apparatus, comprising;

light source image projecting means for projecting an image of a light source;

secondary light source forming means having a light entrance surface and a light exit surface, for forming a secondary light source at the light exit surface thereof in response to projection of the light source image on the light entrance surface thereof;

light projecting means for projecting light from the secondary light source onto an object plane;

pattern projecting means for projecting an image of a pattern placed on the object plane and irradiated with the light, onto an image plane; and

secondary light source adjusting means for changing a light intensity distribution of the secondary light source,

wherein the light source image projecting means comprises illuminance adjusting means for changing the position of the light source image with respect to a direction of an optical axis, so as to reduce a decrease in a quantity of light from the secondary light source caused by a variation in the light intensity distribution of the secondary light source.

49. A device manufacturing method comprising:

projecting and transferring a device pattern of a reticle onto a substrate using a projection exposure apparatus, comprising;

light source image projecting means for projecting an image of a light source;

secondary light source forming means having a light entrance surface and a light exit surface, for forming a secondary light source on the light exit surface thereof in response to projection of the light source image on the light entrance surface thereof;

light projecting means for projecting an image of a pattern, placed on the object plane and irradiated with the light, onto an image plane; and

secondary light source adjusting means for changing a light intensity distribution of the secondary light source,

wherein the light source image projecting means comprises illuminance adjusting means for changing an intensity distribution of light upon the light entrance surface of the secondary light source forming means, to correct an illuminance distribution, to be formed on the image plane asymmetrically with respect to a center due to a variation in the light intensity distribution of the secondary light source, into an illuminance distribution symmetric with respect to the center, and also for changing the position of the light source image with respect to a direction of an optical axis, so as to reduce a decrease in a quantity of light from the secondary light source caused by a variation in the light intensity distribution of the secondary light source.