Treatment apparatus
First Claim
Patent Images
1. A treatment apparatus for depositing sputtering particles on an object to be treated which is arranged in a treatment chamber, comprising:
- a target support for supporting a target to be sputtered;
an object support for supporting an object to be treated by sputtering;
an anode and a cathode for together producing sputtering of particles from a target supported by the target support to an object supported by the object support;
a collimator interposed between the target support and the object support, for regulating the flying direction of sputtering particles from a target supported by the target support, the collimator including a plurality of blocks electrically insulated from each other;
insulating means for insulating the collimator from the anode and the cathode, such that the collimator is in an electrically floating state relative to the anode and the cathode; and
controlling means for applying a variable potential to the collimator.
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Abstract
In a treatment apparatus, a collimator is insulated electrically from the other equipment to be rendered electrically floating, and also the potential of the collimator is variably controllable by a variable DC power source. Therefore, the thickness in plane of the layer to be produced can be uniformalized by controlling the voltage applied to the collimator, without changing both layout and figure of the hardware, e.g., permanent magnet, without process, and further without both beginning and end of a target.
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Citations
18 Claims
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1. A treatment apparatus for depositing sputtering particles on an object to be treated which is arranged in a treatment chamber, comprising:
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a target support for supporting a target to be sputtered; an object support for supporting an object to be treated by sputtering; an anode and a cathode for together producing sputtering of particles from a target supported by the target support to an object supported by the object support; a collimator interposed between the target support and the object support, for regulating the flying direction of sputtering particles from a target supported by the target support, the collimator including a plurality of blocks electrically insulated from each other; insulating means for insulating the collimator from the anode and the cathode, such that the collimator is in an electrically floating state relative to the anode and the cathode; and controlling means for applying a variable potential to the collimator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification