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Treatment apparatus

  • US 5,728,276 A
  • Filed: 08/21/1995
  • Issued: 03/17/1998
  • Est. Priority Date: 08/23/1994
  • Status: Expired due to Fees
First Claim
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1. A treatment apparatus for depositing sputtering particles on an object to be treated which is arranged in a treatment chamber, comprising:

  • a target support for supporting a target to be sputtered;

    an object support for supporting an object to be treated by sputtering;

    an anode and a cathode for together producing sputtering of particles from a target supported by the target support to an object supported by the object support;

    a collimator interposed between the target support and the object support, for regulating the flying direction of sputtering particles from a target supported by the target support, the collimator including a plurality of blocks electrically insulated from each other;

    insulating means for insulating the collimator from the anode and the cathode, such that the collimator is in an electrically floating state relative to the anode and the cathode; and

    controlling means for applying a variable potential to the collimator.

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