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Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

  • US 5,729,331 A
  • Filed: 05/30/1995
  • Issued: 03/17/1998
  • Est. Priority Date: 06/30/1993
  • Status: Expired due to Term
First Claim
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1. An exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of said first object onto said second object, comprising:

  • a first projection optical system for forming a real-size erect image of said first object on said second object, which is telecentric at least on an image side;

    a second projection optical system for forming a real-size erect image of said first object on said second object, which is telecentric at least on the image side and which is disposed next to said first projection optical system;

    a first field stop for limiting an exposure region to be formed on said second object by said first projection optical system, within a certain shape; and

    a second field stop for limiting an exposure region to be formed on said second object by said second projection optical system, within a certain shape;

    wherein a sum of a length along said moving direction, of the first exposure region limited by said first field stop and a length along said moving direction, of the second exposure region limited by said second field stop is constant over a direction perpendicular to said moving direction.

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