Planar palladium structure

• US 5,734,092 A
• Filed: 04/30/1996
• Issued: 03/31/1998
• Est. Priority Date: 05/31/1995
• Status: Expired due to Fees

• Current Assignee: Agilent Technologies, Inc.
• Original Assignee: Hewlett-Packard Company (HP Inc.)
• Inventors: Wang, Tak K., Baker, James W.
• Primary Examiner(s): Williams, Hezron E.
• Assistant Examiner(s): Politzer, Jay L.
• Application Number:
  US08/640,425
• Time in Patent Office: 700 Days
• Field of Search: 73/23.2, 73/23.21, 73/23.22, 73/23.23, 73/23.24, 73/23.25, 73/23.26
• US Class Current: 73/23.25
• CPC Class Codes: B01D 53/228 characterised by specific membranes
• CPC Class Codes: B01D 69/108 Inorganic support material
• CPC Class Codes: B01D 71/02231 Palladium
• CPC Class Codes: C01B 3/505 Membranes containing palladium
• CPC Class Codes: G01N 2030/025 Gas chromatography
• CPC Class Codes: G01N 2030/3007 same temperature for whole column
• CPC Class Codes: G01N 2030/3084 ovens
• CPC Class Codes: G01N 2030/8423 using permeable separator tubes
• CPC Class Codes: G01N 30/30 of temperature

Abstract

A planar palladium structure makes use of the unique properties of palladium to provide a hydrogen permeable membrane suitable for use in providing, for example, selective control of a nominal gas pressure within a cavity. The contemplated planar palladium structure includes a planar substrate having upper and lower major surfaces and an array of microfine channels therebetween, wherein the channels allow gaseous communication between the upper and lower major surfaces, and an array of palladium deposits being distributed on the substrate and located with respect to the microfine channels so as to restrict the gaseous communication to diffusion of hydrogen gas.

Claims

1. A planar palladium structure, comprising:

a planar substrate having upper and lower major surfaces and an array of channels extending therebetween, said channels allowing gaseous communication between said upper and lower major surfaces; and

an array of plural, discrete palladium deposits being distributed on the substrate, said deposits being located in respective channels, said array being distributed with respect to said channels so as to restrict said gaseous communication between said upper and lower major surfaces to a diffusion of hydrogen gas through said deposits;

whereby the substrate constrains the deformation of the palladium deposits due to the diffused hydrogen gas.

2. The structure of claim 1, wherein each of the palladium deposits comprises a thin film layer having an average thickness in the range of 0.1 micrometers to 1 millimeter.

3. The structure of claim 1, wherein each of the palladium deposits comprises a discrete thin film layer located within the respective one of said channels.

4. The structure of claim 1, wherein each of the palladium deposits comprises a discrete thin film layer located over an end of the respective one of said channels.

5. The structure of claim 1, wherein the substrate further comprises a composition of material capable of resisting the flow of electric current therethrough so as to exhibit a temperature increase by way of resistive heating.

6. The structure of claim 1, wherein the substrate further comprises an integral heating element.

7. The structure of claim 1, wherein the channels are regularly spaced.

8. The structure of claim 1, wherein said channels are irregularly spaced.

9. The structure of claim 1, wherein the substrate is formed of porous material.

10. A hydrogen pump system comprising:

a housing that defines a closed cavity;

a planar palladium structure attached within the closed cavity so as to provide upper and lower subcavities, said planar palladium structure including a planar substrate having upper and lower major surfaces and an array of hollow channels extending therebetween, said channels allowing gaseous communication between said upper and lower major surfaces, and an array of plural, discrete palladium deposits being distributed on the substrate, said deposits being located in a respective channels, said array being distributed with respect to said channels so as to restrict said gaseous communication between said upper and lower major surfaces to diffusion of hydrogen gas through said deposits;

whereby the substrate constrains the deformation of the palladium deposits due to the diffused hydrogen gas; and

a system for providing hydrogen in at least one of the upper and lower subcavities.

11. The hydrogen pump system of claim 10, further comprising means for heating or cooling the planar palladium structure.