Monocrystalline ceramic coating having integral bonding interconnects for electrostatic chucks
First Claim
1. An erosion resistant electrostatic chuck for holding substrates in a process chamber, the chuck comprising:
- (a) at least one mesh electrode on an underlying dielectric layer, the mesh electrode having apertures therethrough; and
(b) a monocrystalline ceramic covering the mesh electrode, the monocrystalline ceramic comprising;
(i) a layer of large crystals substantially oriented to one another, the layer of crystals having a resistivity sufficiently high to electrically insulate the mesh electrode; and
(ii) integral bonding interconnects that form a unitary structure with the layer of large crystals, the bonding interconnects extending through the apertures in the mesh electrode to bond directly to the underlying dielectric layer.
1 Assignment
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Accused Products
Abstract
An electrostatic chuck (20) comprises at least one mesh electrode (30) on an underlying dielectric layer (25), the mesh electrode having apertures therethrough. A monocrystalline ceramic (28) covers the mesh electrode (30). The monocrystalline ceramic (28) comprises a layer of large crystals substantially oriented to one another, the layer of crystals having a resistivity sufficiently high to electrically insulate the mesh electrode (30). The monocrystalline ceramic (28) further comprises integral bonding interconnects (40) that form a unitary structure with the layer of large crystals, the bonding interconnects extending through the apertures in the mesh electrode (30) to bond directly to the underlying dielectric layer (25), substantially without adhesive.
70 Citations
58 Claims
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1. An erosion resistant electrostatic chuck for holding substrates in a process chamber, the chuck comprising:
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(a) at least one mesh electrode on an underlying dielectric layer, the mesh electrode having apertures therethrough; and (b) a monocrystalline ceramic covering the mesh electrode, the monocrystalline ceramic comprising; (i) a layer of large crystals substantially oriented to one another, the layer of crystals having a resistivity sufficiently high to electrically insulate the mesh electrode; and (ii) integral bonding interconnects that form a unitary structure with the layer of large crystals, the bonding interconnects extending through the apertures in the mesh electrode to bond directly to the underlying dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming a monocrystalline ceramic layer on a workpiece surface, the method comprising the steps of:
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(a) melting a ceramic in a melt reservoir to form a molten ceramic; (b) positioning a capillary tube in the molten ceramic of the melt reservoir, the capillary tube comprising; (i) an inlet in the reservoir; and (ii) an outlet adjacent to the workpiece surface, the outlet comprising (1) a leading edge having a first height and a seeding surface, and (2) a trailing edge having a second height smaller than the first height; (c) moving the outlet of the capillary tube across the workpiece surface in a direction such that leading edge of the capillary tube moves ahead of the trailing edge, to deposit on the workpiece surface, a molten ceramic layer (i) drawn through the capillary tube, (ii) seeded by the seeding surface of the leading edge, and (iii) having a thickness t substantially controlled by the difference in first and second heights; and (d) cooling the seeded molten ceramic layer to form a monocrystalline ceramic layer comprising large crystals substantially oriented to one another. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
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19. A method for fabricating an erosion resistant electrostatic chuck for holding a substrate thereon, the method comprising the steps of:
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(a) forming a mesh electrode on a dielectric layer, the mesh electrode having an exposed surface and apertures therethrough; (b) melting a ceramic in a melt reservoir to form a molten ceramic; (c) positioning a capillary tube in the melt reservoir, the capillary tube comprising; (i) an inlet immersed in the molten ceramic of the melt reservoir, and (ii) an outlet adjacent to the exposed surface of the electrode, the outlet comprising (1) a leading edge having a first height and a seeding surface, and (2) a trailing edge having a second height smaller than the first height; (d) moving the outlet of the capillary tube across the exposed surface of the electrode in a direction such that leading edge of the capillary tube moves ahead of the trailing edge, to deposit on the exposed surface, a molten ceramic layer (i) drawn through the capillary tube, (ii) seeded by the seeding surface of the leading edge, and (iii) having a thickness t substantially controlled by the difference in first and second heights; and (e) cooling the seeded molten ceramic layer to form a monocrystalline ceramic layer comprising large crystals substantially oriented to one another. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. An electrostatic chuck for holding substrates in a process chamber, the chuck comprising:
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(a) a first monocrystalline ceramic layer comprising at least one mesh electrode thereon, the mesh electrode having apertures therethrough; and (b) a second monocrystalline ceramic layer covering the mesh electrode, the second monocrystalline ceramic layer comprising integral bonding interconnects that extend through the apertures in the mesh electrode to bond directly to the first monocrystalline ceramic layer, wherein the first and second monocrystalline ceramic layers comprise large crystals substantially oriented to one another, the crystals having a resistivity sufficiently high to electrically insulate the mesh electrode. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36)
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37. A method for fabricating an electrostatic chuck for holding a substrate thereon, the method comprising the steps of:
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(a) forming a first monocrystalline ceramic layer; (b) forming a mesh electrode on a first monocrystalline ceramic layer, the mesh electrode having an exposed surface and apertures therethrough; (c) melting a ceramic in a melt reservoir to form a molten ceramic; (d) positioning a capillary tube in the melt reservoir, the capillary tube comprising; (i) an inlet immersed in the molten ceramic of the melt reservoir, and (ii) an outlet adjacent to the exposed surface of the mesh electrode, the outlet comprising (1) a leading edge having a first height and a seeding surface, and (2) a trailing edge having a second height smaller than the first height; (e) moving the outlet of the capillary tube across the exposed surface of the electrode in a direction such that leading edge of the capillary tube moves ahead of the trailing edge, to deposit on the exposed surface, a molten ceramic layer (i) drawn through the capillary tube, (ii) seeded by the seeding surface of the leading edge, and (iii) having a thickness t substantially controlled by the difference in first and second heights; and (f) cooling the seeded molten ceramic layer to form a monocrystalline ceramic layer comprising large crystals substantially oriented to one another. - View Dependent Claims (38, 39, 40, 41, 42, 43)
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44. An electrostatic chuck for holding a substrate in a process chamber, the chuck comprising:
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(a) a monocrystalline ceramic comprising large crystals substantially oriented to one another; (b) an electrode embedded in the monocrystalline ceramic for electrostatically holding the substrate upon application of a voltage to the electrode; and (c) an electrical connector for supplying a voltage to the electrode, the electrical connector extending through the monocrystalline ceramic. - View Dependent Claims (45, 46, 47, 48, 49, 50, 51)
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52. An electrostatic chuck for holding a substrate in a process chamber, the chuck comprising:
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(a) a mesh electrode having apertures therethrough; (b) an unitary structure of monocrystalline ceramic surrounding the mesh electrode, the monocrystalline ceramic comprising large crystals substantially oriented to one another, and bonding interconnects integral to the crystals and extending through the apertures in the mesh electrode to hold the mesh electrode in the unitary structure; and (c) an electrical connector extending through the unitary structure to provide a voltage to the electrode. - View Dependent Claims (53, 54, 55, 56, 57, 58)
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Specification