Microelectrodes and amperometric assays

• US 5,739,039 A
• Filed: 03/06/1995
• Issued: 04/14/1998
• Est. Priority Date: 12/04/1989
• Status: Expired due to Term

• Current Assignee: Palintest Limited (Halma PLC)
• Original Assignee: Ecossensors Limited
• Inventors: Girault, Hubert Hugues Jacques, Seddon, Brian Jeffrey
• Primary Examiner(s): Warden, Robert J.
• Assistant Examiner(s): CARRILLO, BIBI SHARIDAN
• Application Number:
  US08/399,177
• Time in Patent Office: 1,135 Days
• Field of Search: 204/153.1, 204/153.12, 204/153.17, 204/294, 204/403, 204/413, 204/414, 204/416, 204/434, 436/149, 422/82.01, 422/82.02, 422/98
• US Class Current: 204/403.14
• CPC Class Codes: G01N 27/403 Cells and electrode assemblies
• CPC Class Codes: G01N 27/42 Measuring deposition or liberation of materials from an electrolyte; Coulometry, i.e. measuring coulomb-equivalent of material in an electrolyte
• CPC Class Codes: G01N 33/1813 Specific cations in water, e.g. heavy metals

Abstract

A photo-ablation technique is used to create apertures (4) in a layer (2) of electrically insulating material and allow electrically conducting material (3) exposed through the apertures to create a microelectrode. The microelectrode can be used for assay methods and in an assay unit.

Claims

1. In a method of making a microelectrode comprising a layer of electrically insulating material having an array of apertures formed therein and electrically conducting material visible through the apertures, the improvement wherein a layer of carbon electrically conductive material is laid on a plastic substrate below the electrically insulating material and the apertures are drilled in the insulating layer to expose the carbon electrically conduction material by photo-ablating each aperture required.

3. A microelectrode made by the method of claim 1, in which the improvement further comprises the fact that the layer of insulating material has a thickness in the range of 2 to 500 microns and each aperture has a maximum dimension measured traversely to the direction of the thickness of the insulating layer of between 5 and 100 microns.

4. A method according to claim 1 in which all of the apertures in the array are formed simultaneously.

2. In a method of making a microelectrode consisting of a layer of electrically conductive material, and a layer of electrically insulating material having first and second sides and, an array of apertures formed therein and extending from said first side to said second side whereby said electrically conductive material is visible through the apertures, the improvement wherein the apertures are formed by photo-ablation, the insulating layer is a plastics film and the conductive material is a carbon material applied to one side of the film after the apertures have been formed therein.