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Rapid thermal heating apparatus and method

  • US 5,743,643 A
  • Filed: 10/16/1996
  • Issued: 04/28/1998
  • Est. Priority Date: 01/19/1990
  • Status: Expired due to Term
First Claim
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1. A method of measuring the temperature across a substrate during processing in a vacuum chamber having a quartz window, said substrate heated during processing by radiation from a radiant energy source that passes through the quartz window, comprising:

  • positioning a substrate in the vacuum chamber so that one side of the substrate faces the quartz window and another side of the substrate faces away from the quartz window;

    positioning a radiation detector so that it images the side of the substrate that faces away from the quartz window;

    using the quartz window to absorb the radiation from the radiant energy source such that it is not sensed by the radiation detector;

    sensing infrared radiation emitted by the substrate with the radiation detector; and

    determining any differences in the temperature of different regions of the substrate from the sensed radiation.

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