Rapid thermal heating apparatus and method
First Claim
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1. A method of measuring the temperature across a substrate during processing in a vacuum chamber having a quartz window, said substrate heated during processing by radiation from a radiant energy source that passes through the quartz window, comprising:
- positioning a substrate in the vacuum chamber so that one side of the substrate faces the quartz window and another side of the substrate faces away from the quartz window;
positioning a radiation detector so that it images the side of the substrate that faces away from the quartz window;
using the quartz window to absorb the radiation from the radiant energy source such that it is not sensed by the radiation detector;
sensing infrared radiation emitted by the substrate with the radiation detector; and
determining any differences in the temperature of different regions of the substrate from the sensed radiation.
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Abstract
A rapid thermal heating apparatus in which lamps are disposed in a plurality of light pipes arranged to illuminate and supply heat to a substrate. The light pipes are positioned so that the illumination patterns overlap. The energy supplied to the lamps is controlled to provide a predetermined heating pattern to the substrate. A liquid cooled window cooperates with the light pipes to transmit energy to a wafer disposed in an evacuated chamber.
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4 Claims
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1. A method of measuring the temperature across a substrate during processing in a vacuum chamber having a quartz window, said substrate heated during processing by radiation from a radiant energy source that passes through the quartz window, comprising:
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positioning a substrate in the vacuum chamber so that one side of the substrate faces the quartz window and another side of the substrate faces away from the quartz window; positioning a radiation detector so that it images the side of the substrate that faces away from the quartz window; using the quartz window to absorb the radiation from the radiant energy source such that it is not sensed by the radiation detector; sensing infrared radiation emitted by the substrate with the radiation detector; and determining any differences in the temperature of different regions of the substrate from the sensed radiation. - View Dependent Claims (2, 3)
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4. An apparatus for measuring the temperature across a substrate during processing, the apparatus comprising:
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a radiant energy source constructed to produce radiation for heating a substrate during processing; a quartz window; a substrate carrier constructed to support the substrate so that one side of the substrate faces the quartz window and another side of the substrate faces away from the quartz window, the substrate carrier being positioned so that the substrate is heated by radiation from the radiant energy source that passes through the quartz window; a radiation detector positioned to image the side of the substrate that faces away from the quartz window, the radiation detector being constructed to sense infrared radiation emitted by the substrate and to produce signals representative of the sensed radiation; and a circuit constructed to receive the signals from the radiation detector and to determine from the received signals received any differences in the temperature of different regions of the substrate; wherein the quartz window absorbs the radiation from the radiant energy source such that it is not sensed by the radiation detector.
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Specification