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Method and device for in situ stress measurement within a thin film upon its deposition on a substrate

  • US 5,745,240 A
  • Filed: 06/03/1996
  • Issued: 04/28/1998
  • Est. Priority Date: 05/11/1994
  • Status: Expired due to Fees
First Claim
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1. In a method for the deposition of a thin film on substrates in a processing chamber, the substrates being supported on a rotatable collective holder having a plurality of sites therefor and the thin film being deposited in the course of rotation of the collective holder, further comprising the steps of:

  • providing an individual holder for carrying a test sample at one of the plurality of sites on the collective holder, and at least part of a sensor adapted to measure deformation of the test sample; and

    measuring with the sensor deformation of the thin film deposited on the test sample so as to determine the stress within the film deposited on the test sample and thereby the stress within the film deposited on the substrates.

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