Method and device for in situ stress measurement within a thin film upon its deposition on a substrate
First Claim
1. In a method for the deposition of a thin film on substrates in a processing chamber, the substrates being supported on a rotatable collective holder having a plurality of sites therefor and the thin film being deposited in the course of rotation of the collective holder, further comprising the steps of:
- providing an individual holder for carrying a test sample at one of the plurality of sites on the collective holder, and at least part of a sensor adapted to measure deformation of the test sample; and
measuring with the sensor deformation of the thin film deposited on the test sample so as to determine the stress within the film deposited on the test sample and thereby the stress within the film deposited on the substrates.
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Abstract
In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.
21 Citations
24 Claims
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1. In a method for the deposition of a thin film on substrates in a processing chamber, the substrates being supported on a rotatable collective holder having a plurality of sites therefor and the thin film being deposited in the course of rotation of the collective holder, further comprising the steps of:
- providing an individual holder for carrying a test sample at one of the plurality of sites on the collective holder, and at least part of a sensor adapted to measure deformation of the test sample; and
measuring with the sensor deformation of the thin film deposited on the test sample so as to determine the stress within the film deposited on the test sample and thereby the stress within the film deposited on the substrates.
- providing an individual holder for carrying a test sample at one of the plurality of sites on the collective holder, and at least part of a sensor adapted to measure deformation of the test sample; and
- 2. Device for in situ determination of stresses within a thin film deposited on substrates in the course of deposition inside a processing chamber, the device comprising a rotatable collective holder having a plurality of sites for receiving substrates for the deposition of thin film thereon, said rotatable collective holder having a site receiving an individual holder for carrying a test sample on which the thin film is also adapted to be deposited, and said individual holder carrying at least part of a sensor for measuring deformation of the test sample in situ.
Specification