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Method of chemical vapor deposition for producing layer variation by planetary susceptor rotation

  • US 5,747,113 A
  • Filed: 07/29/1996
  • Issued: 05/05/1998
  • Est. Priority Date: 07/29/1996
  • Status: Expired due to Fees
First Claim
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1. A chemical vapor deposition method for depositing at least one layer of material onto a plurality of substrates, comprising the steps of:

  • providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, androtating said secondary susceptors simultaneously at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more significantly different rotation rates is not zero.

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