Method of chemical vapor deposition for producing layer variation by planetary susceptor rotation
First Claim
1. A chemical vapor deposition method for depositing at least one layer of material onto a plurality of substrates, comprising the steps of:
- providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, androtating said secondary susceptors simultaneously at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more significantly different rotation rates is not zero.
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Abstract
A chemical vapor deposition process for depositing at least one layer of material onto a plurality of substrates is disclosed, which comprises providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneouly at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more signicantly different rotation rates is not zero.
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Citations
10 Claims
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1. A chemical vapor deposition method for depositing at least one layer of material onto a plurality of substrates, comprising the steps of:
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providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more significantly different rotation rates is not zero. - View Dependent Claims (2, 3, 4)
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5. A chemical vapor deposition method for depositing a plurality of layers of material onto a plurality of substrates, comprising the steps of:
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providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two independent rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at two or more significantly different rotation rates during at least a portion of depositing said layers, wherein at least one of said two or more significantly different rotation rates is not zero. - View Dependent Claims (6, 7, 8, 9, 10)
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Specification