Lighting assembly, exposure apparatus and exposure method employing the lighting assembly

• US 5,748,288 A
• Filed: 03/08/1996
• Issued: 05/05/1998
• Est. Priority Date: 03/08/1995
• Status: Expired due to Fees

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Inoue, Takashi, Yamashita, Hiroshi, Fujita, Keiji, Nagano, Hiroyuki, Sato, Takeo
• Primary Examiner(s): Pendegrass, Joan H.
• Application Number:
  US08/613,027
• Time in Patent Office: 788 Days
• Field of Search: 355/53, 355/67, 355/68, 355/71, 355/72, 355/73
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces

Abstract

The present invention provides spot-illumination of a specific size having sufficiently homogeneous light intensity distribution, with a small and inexpensive apparatus. A lighting assembly condenses the light from light source 1 with condensing-reflecting member 2. An optical integrator 3 receives at its one end the light via condensing-reflecting member 2 and emits from the other end after making the light intensity distribution homogeneous A projection lens system 4 projects the emitting surface of optical integrator 3 onto an emitted surface. By shifting the relative positioning between the lighting assembly and the substrate 11, and adjusting the distance between the substrate 11 and the mask 12, which stores a pattern to be formed, a specified area of the exposure surface 11a is scanned and exposed to have a mask pattern transcribed on the exposure surface 11a.

Claims

1. A lighting assembly for projecting an image onto a surface of a substrate, said lighting assembly comprising:

a light source;

a condensing-reflecting member for condensing light from said light source;

an optical integrator, having a receiving end and an emitting end, for receiving light from said light source, causing the light to attain a homogeneous light intensity distribution, and emitting the homogeneously distributed light from said emitting end;

a projection lens system, having a receiving end and a projecting end, for receiving the homogeneously distributed light emitted by said optical integrator, and projecting the homogeneously distributed light from said projecting end; and

an image transcribing mask disposed adjacent said projecting end of said projection lens system.

2. A lighting assembly, as claimed in claim 1, wherein said optical integrator is comprised of a rod having a length and a polygon shaped cross-section having an even number of sides.

3. A lighting assembly, as claimed in claim 2, wherein dimensions of said rod are such that a ratio of said length to a maximum cross-sectional dimension of said polygon shaped cross-section is between a range from 2 to 50.

4. A lighting assembly, as claimed in claim 1, wherein said light source is comprised of a mercury lamp and said optical integrator is comprised of a quartz material.

5. A lighting assembly, as claimed in claim 1, wherein said projection lens system is comprised of a first lens group and a second lens group.

6. A lighting assembly, as claimed in claim 1, wherein said projection lens system further includes a trimming aperture for trimming the light to form a spot light having a predetermined form and dimension;

said trimming aperture being disposed at said projecting end of said projection lens system.

7. A lighting assembly, as claimed in claim 1, further comprising a cold mirror for reflecting the light from said condensing-reflecting member into said receiving end of said optical integrator.

8. A lighting assembly, as claimed in claim 1, further comprising an optical fiber disposed between said light source and said receiving end of said optical integrator.

9. A lighting assembly, as claimed in claim 1, further comprising an angle distribution smoothing means, disposed between said light source and said receiving end of said optical integrator, for reducing angle fluctuations of the light entering said receiving end of said optical integrator.

10. An exposure apparatus, for exposing an image onto a surface of a substrate, said exposing apparatus comprising:

a lighting assembly;

a substrate retaining device;

a transfer means for adjusting a position of said lighting assembly relative to the substrate retaining device;

wherein said lighting assembly comprises a light source;

a condensing-reflecting member for condensing light from said light source;

an optical integrator, having a receiving end and an emitting end, for receiving light from said light source, causing the light to attain a homogeneous light intensity distribution, and emitting the homogeneously distributed light from said emitting end;

a projection lens system, having a receiving end and a projecting end, for receiving the homogeneously distributed light emitted by said optical integrator, and projecting the homogeneously distributed light from said projecting end; and

an image transcribing mask disposed adjacent said projecting end of said projection lens system; and

an adjusting means for adjusting a position of the image transcribing mask relative to the substrate retaining device.

11. The exposure apparatus, as claimed in claim 10, wherein said adjusting means comprises a mask deforming means for deforming the image transcribing mask at a specified area thereof;

and

said mask deforming means is disposed at a location adjacent said projecting end of said projection lens system.

12. The exposure apparatus, as claimed in claim 11, wherein said mask deforming means includes an air blowing nozzle.

13. The exposure apparatus, as claimed in claim 12, wherein said air blowing nozzle is operable to blow air against said specified area of said image transcribing mask to thereby deform said specified area of said image transcribing mask toward said substrate retaining device.

14. The exposure apparatus, as claimed in claim 12, wherein said mask deforming means includes a suction port.

15. The exposure apparatus, as claimed in claim 14, wherein said suction port is operable to create a suction pressure at said specified area of said image transcribing mask to thereby deform said specified area of said image transcribing mask away from said substrate retaining device.

16. The exposure apparatus, as claimed in claim 11, wherein said mask deforming means includes a suction port.

17. The exposure apparatus, as claimed in claim 16, wherein said suction port is operable to create a suction pressure at said specified area of said image transcribing mask to thereby deform said specified area of said image transcribing mask away from said substrate retaining device.

18. An exposure method, for exposing an image onto a surface of a substrate, said exposure method comprising:

providing a lighting assembly comprising a light source;

a condensing-reflecting member for condensing light from said light source;

an optical integrator, having a receiving end and an emitting end, for receiving light from said light source, causing the light to attain a homogeneous light intensity distribution, and emitting the homogeneously distributed light from said emitting end;

a projection lens system, having a receiving end and a projecting end, for receiving the homogeneously distributed light emitted by said optical integrator, and projecting the homogeneously distributed light from said projecting end; and

an image transcribing mask disposed adjacent said projecting end of said projection lens system;

exposing the surface of the substrate to the homogeneously distributed light projected from said projecting end of said projection lens system via the image transcribing mask; and

scanning the surface of the substrate with the homogeneously distributed light by adjusting a position of the lighting assembly relative to the substrate.

19. An exposure method, as claimed in claim 18, further comprising adjusting a position of the image transcribing mask relative to the substrate.

20. An exposure method, as claimed in claim 19, wherein said adjusting of a position of the image transcribing mask relative to the substrate is performed by deforming the image transcribing mask at a specified area thereof by blowing compressed air toward said specified area of the image transcribing mask.

21. An exposure method, as claimed in claim 19, wherein said adjusting of a position of the image transcribing mask relative to the substrate is performed by deforming the image transcribing mask at a specified area by creating a suction at said specified area of the image transcribing mask.