Method of removing particles by adhesive
First Claim
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1. A method for removing dust particles from a surface of a semiconductor wafer, comprising the sequential steps of:
- a) providing a flexible substantially planar medium, having first and second sides, the first side being coated with a layer, having a thickness, of a soft adhesive material;
b) pressing said adhesive layer against the entire wafer surface by applying a pressure to the second side, said pressure applying the entire adhesive layer to the entire wafer surface; and
c) removing the entire adhesive layer from the surface of the wafer by pulling said flexible substantially planar medium away from the wafer surface.
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Abstract
The removal of particulate contaminants, such as dust particles, from the surface of a semiconductor wafer is achieved by pressing a soft adhesive layer against the wafer surface, leaving it in place for a short time and then removing it. The adhesive is brought to the wafer surface on a flexible medium which serves as a backing layer and to whose other side pressure can be applied. To remove the adhesive, the backing layer is peeled off, either by pulling on one end or by passing a sticky roller over it. The operation may be performed in air or under vacuum.
40 Citations
17 Claims
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1. A method for removing dust particles from a surface of a semiconductor wafer, comprising the sequential steps of:
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a) providing a flexible substantially planar medium, having first and second sides, the first side being coated with a layer, having a thickness, of a soft adhesive material; b) pressing said adhesive layer against the entire wafer surface by applying a pressure to the second side, said pressure applying the entire adhesive layer to the entire wafer surface; and c) removing the entire adhesive layer from the surface of the wafer by pulling said flexible substantially planar medium away from the wafer surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for removing dust particles from a surface of a semiconductor wafer, comprising the sequential steps of:
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a) providing a flexible substantially planar medium, having first and second sides, the first side being coated with a layer, having a thickness, of a soft adhesive material; b) providing a roller to which said second side will stick when brought into contact with the roller; c) pressing said adhesive layer against the entire wafer surface by applying a pressure to the second side said pressure applying the entire adhesive layer to the entire wafer surface; and d) removing the entire adhesive layer from the surface of the wafer by rolling the roller over said second side. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
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Specification