Ellipsometric microscope
First Claim
1. An apparatus for measuring the thickness of a thin film sample, the apparatus comprising:
- light source means for emitting an incident beam of monochromatic, collimated light;
means for directing said incident beam along an incident path for impingement on the film sample at a predetermined, non-normal angle with respect thereto, there being a reflectance beam reflecting from the film sample along a reflectance path, said reflectance beam including a plurality of components, said components presenting phase angles;
polarization means for elliptically polarizing said incident beam, said polarizing means including means for shifting said phase angles of said components;
detecting means including a charged coupled device camera having a detection face for detecting said reflectance beam;
analyzing means coupled with said detecting means for analyzing said reflectance beam for determining the thickness of the film sample; and
beam expansion means positioned in said reflectance path between the film sample and said detecting means for expanding said reflectance beam, and permitting passage of said components of said reflectance beam to said detection face that are generally parallel with respect to each other without forming a real image of the sample on said detection face of said detecting means.
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0 Petitions
Accused Products
Abstract
The ellipsometric microscope (10) broadly includes a light source (14) for emitting a beam of monocromatic, collimated light, an adjustable support assembly (12) for directing the light beam along an incident path (56) for impingement on a film sample (58) at a predetermined angle for reflectance off of the sample along a reflectance path (60), and a detector (34) for detecting the reflectance beam. A polarizer (20) is positioned along the incident path (56) for elliptically polarizing the incident beam, and a remotely controllable variable retarder (22) is also positioned along the incident path (56) for altering the elliptical polarization of the incident beam. A beam expander (30) is positioned along the reflectance path (60) between the film sample (58) and the detector (34) for expanding the beam of light, and permitting only passage of parallel components of the reflectance beam. An analyzer (36) is coupled with the detector (34) for analyzing the reflectance beam for determining the thickness of the film sample (58).
60 Citations
13 Claims
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1. An apparatus for measuring the thickness of a thin film sample, the apparatus comprising:
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light source means for emitting an incident beam of monochromatic, collimated light; means for directing said incident beam along an incident path for impingement on the film sample at a predetermined, non-normal angle with respect thereto, there being a reflectance beam reflecting from the film sample along a reflectance path, said reflectance beam including a plurality of components, said components presenting phase angles; polarization means for elliptically polarizing said incident beam, said polarizing means including means for shifting said phase angles of said components; detecting means including a charged coupled device camera having a detection face for detecting said reflectance beam; analyzing means coupled with said detecting means for analyzing said reflectance beam for determining the thickness of the film sample; and beam expansion means positioned in said reflectance path between the film sample and said detecting means for expanding said reflectance beam, and permitting passage of said components of said reflectance beam to said detection face that are generally parallel with respect to each other without forming a real image of the sample on said detection face of said detecting means. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An apparatus for measuring the thickness of a thin film sample, the apparatus comprising:
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light source means for emitting an incident beam of monochromatic, collimated light; means for directing said incident beam along an incident path for impingement on the film sample at a predetermined, non-normal angle with respect thereto, there being a reflectance beam reflecting from the film sample along a reflectance path, said reflectance beam including a plurality of components; polarization means for elliptically polarizing said incident beam, and for altering the elliptical polarization of said incident beam; detecting means including a charged coupled device camera having a detection face for detecting said reflectance beam; analyzing means coupled with said detecting means for analyzing said reflectance beam for determining the thickness of the film sample; and beam expansion means positioned in said reflectance path between the film sample and said detecting means for expanding said reflectance beam, and for preventing passage of said components of said reflectance beam to said detection means that are generally not parallel with respect to each other, said beam expansion means permitting passage of generally parallel components of said reflectance beam to said detection means without forming a real image of the sample on said detection face of said detecting means.
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Specification