Variable width low profile gate array input/output architecture
First Claim
1. A gate array masterslice formed on a semiconductor substrate, the gate array masterslice comprising:
- (a) a plurality of identical input/output slots, each of said input/output slots having;
(i) a first region containing a plurality of tuning transistors of different physical sizes;
(ii) a second region having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors;
(iii) a third region having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors;
(iv) a fourth region containing one or more devices for providing electrostatic discharge protection; and
(b) a plurality of bonding pads, at least some of which are electrically connected to at least some of said input/output slots, wherein said plurality of bonding pads have a variable bonding pad pitch, and wherein the first region, the second region, the third region and the fourth region are contiguous to one another and the fourth region is closest to a bonding pad of the plurality of bonding pads.
11 Assignments
0 Petitions
Accused Products
Abstract
A gate array masterslice having a minimal input/output slot and variable pad pitch architecture is disclosed. In the masterslice, many identical input/output slots ring the periphery of a semiconductor substrate and contain only the special devices necessary for input/output circuits. Each of the input/output slots include (i) a first region containing a plurality of tuning transistors of different sizes, (ii) a second region having one or more PMOS transistors, each of a size greater than any one of the plurality of tuning transistors, (iii) a third region having one or more NMOS transistors, each of a size greater than any one of the plurality of tuning transistors, and (iv) a fourth region containing one or more devices for providing electrostatic discharge protection. One to four PMOS transistors are provided in the second slot region and one to four NMOS transistors are provided in the third slot region. A plurality of bonding pads are provided, at least some of which are electrically connected to at least some of the input/output slots such that the plurality of bonding pads may have a variable bonding pad pitch.
67 Citations
47 Claims
-
1. A gate array masterslice formed on a semiconductor substrate, the gate array masterslice comprising:
-
(a) a plurality of identical input/output slots, each of said input/output slots having; (i) a first region containing a plurality of tuning transistors of different physical sizes; (ii) a second region having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) a third region having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iv) a fourth region containing one or more devices for providing electrostatic discharge protection; and (b) a plurality of bonding pads, at least some of which are electrically connected to at least some of said input/output slots, wherein said plurality of bonding pads have a variable bonding pad pitch, and wherein the first region, the second region, the third region and the fourth region are contiguous to one another and the fourth region is closest to a bonding pad of the plurality of bonding pads. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A gate array masterslice formed on a semiconductor substrate, comprising:
-
(a) a core region having a plurality of identical base cells, each of which contains multiple transistors; (b) a plurality of identical input/output slots, each of said input/output slots having; (i) a first region adjacent said core region and containing a plurality of tuning transistors of different physical sizes; (ii) a second region adjacent to said first region, and containing at most four PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) a third region adjacent to said second region, and containing at most four NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; and (iv) a fourth region adjacent to said third region, and containing one or more devices for providing electrostatic discharge protection; and (c) a plurality of bonding pads, at least some of which are electrically connected to at least some of said input/output slots, wherein the first region, the second region, the third region and the fourth region are contiguous with one another. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
-
-
21. A gate array masterslice formed on a semiconductor substrate, comprising:
-
(a) a core region having a plurality of identical base cells, each of which contains multiple transistors of no more than a defined gate length and no more than a defined gate width; (b) a plurality of identical input/output slots, each of said input/output slots having; (i) a first region adjacent to said core region, and containing a plurality of tuning transistors of different physical sizes; (ii) a second region adjacent to said first region, and having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) a third region adjacent to said second region, and having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; and (iv) a fourth region adjacent to said third region, and containing one or more devices for providing electrostatic discharge protection; and (c) a plurality of bonding pads, at least some of which are electrically connected to at least some of said input/output slots, wherein each transistor in the first, second, and third regions of said input/output slots has either (i) a gate width that is greater than said defined gate width, (ii) a gate length that is greater than said defined gate length, or (iii) both, and wherein the first, second, third and fourth regions are contiguous with one another. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
-
-
29. A method of fabricating a gate array masterslice formed on a semiconductor substrate, the method comprising the steps of:
-
(a) forming a plurality of identical input/output slots on said semiconductor substrate, each of said input/output slots made by; (i) forming a first region containing a plurality of tuning transistors of different physical sizes; (ii) forming a second region having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) forming a third region having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iv) forming a fourth region containing one or more devices for providing electrostatic discharge protection; (b) forming a plurality of bonding pads separated from one another by a variable pad pitch, wherein the first, second, third and fourth regions are formed contiguous with one another, and the fourth region is closest to a bonding pad of the plurality of bonding pads. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37, 38)
-
-
39. A gate array masterslice formed on a semiconductor substrate, the gate array masterslice comprising:
-
(a) a plurality of identical input/output slots, each of said input/output slots having; (i) a first region containing a plurality of tuning transistors of different physical sizes; (ii) a second region having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) a third region having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors, and each of said second and third regions of the plurality of input/output slots contains four or fewer transistors; (iv) a fourth region containing one or more devices for providing electrostatic discharge protection; and (b) a plurality of bonding pads, at least some of which are electrically connected to at least some of said input/output slots, wherein said plurality of bonding pads have a variable bonding pad pitch, and wherein the first region, the second region, the third region and the fourth region are contiguous to one another. - View Dependent Claims (40, 41, 42)
-
-
43. A method of fabricating a gate array masterslice formed on a semiconductor substrate, the method comprising the steps of
(a) forming a plurality of identical input/output slots on said semiconductor substrate, each of said input/output slots made by; -
(i) forming a first region containing a plurality of tuning transistors of different physical sizes; (ii) forming a second region having one or more PMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors; (iii) forming a third region having one or more NMOS transistors, each of a physical size greater than any one of said plurality of tuning transistors, and each of said second and third regions of the plurality of input/output slots is formed with four or fewer transistors; (iv) forming a fourth region containing one or more devices for providing electrostatic discharge protection; (b) forming a plurality of bonding pads separated from one another by a variable pad pitch, wherein the first, second, third and fourth regions are formed contiguous with one another. - View Dependent Claims (44, 45, 46, 47)
-
Specification