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Vacuum apparatus for semiconductor device

  • US 5,760,693 A
  • Filed: 04/30/1996
  • Issued: 06/02/1998
  • Est. Priority Date: 09/25/1995
  • Status: Expired due to Term
First Claim
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1. A vacuum apparatus, comprising:

  • a vacuum chamber;

    a gas input controlling unit connected to the vacuum chamber;

    a ventilating unit connected to the vacuum chamber;

    a device controlling unit connected to a vacuum chamber; and

    a vacuum parameter measuring and controlling unit connected to the vacuum chamber for measuring actual values for a plurality of vacuum parameters, comparing the actual values with respective predetermined values for the plurality of vacuum parameters, and for stopping the gas input controlling unit from functioning when one of the actual values for the plurality of vacuum parameters is smaller than the respective predetermined value for the one of the plurality of vacuum parameters,wherein the plurality of vacuum parameters comprise pressure and time for reaching a desired pressure.

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