Antireflection filter

• US 5,763,061 A
• Filed: 06/14/1996
• Issued: 06/09/1998
• Est. Priority Date: 06/15/1995
• Status: Expired due to Term

• Current Assignee: Daikin Industries Ltd, Sumitomo Chemical Company Limited
• Original Assignee: Daikin Industries Ltd, Sumitomo Chemical Company Limited
• Inventors: Tanaka, Yuji, Hachisuka, Hitoharu, Ochiai, Shinsuke, Yasunori, Yukio
• Primary Examiner(s): NAKARANI, DHIRAJLAL S
• Application Number:
  US08/663,914
• Time in Patent Office: 725 Days
• Field of Search: 427/387, 428/215, 428/336, 428/337, 428/412, 428/425.5, 428/447, 428/448, 428/451, 428/452, 428/425.6, 428/428, 428/429
• US Class Current: 428/215
• CPC Class Codes: G02B 1/111 using layers comprising organic materials
• CPC Class Codes: G02B 1/113 using inorganic layer materials only
• CPC Class Codes: G02B 1/18 Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films G02B1/16 takes precedence
• CPC Class Codes: G02B 27/0006 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation G02B1/18 takes precedence; cleaning in general B08B
• CPC Class Codes: Y10T 428/24967 Absolute thicknesses specified
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/266 of base or substrate
• CPC Class Codes: Y10T 428/31507 Of polycarbonate
• CPC Class Codes: Y10T 428/31612 As silicone, silane or siloxane
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane
• CPC Class Codes: Y10T 428/31667 Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Abstract

An antireflection filter comprising a film- or sheet-form transparent substrate, an antireflection coating on at least one surface of the substrate, which coating contains an inorganic compound, and a stain proofing layer on the antireflection coating, which layer contains a specific silane compound having an average molecular weight of 5×10² to 1×10⁵.

Claims

1. An antireflection filter comprising a transparent substrate in the form of a film or sheet, an antireflection coating on at least one surface of said substrate, which coating comprises an inorganic compound, and a stain proofing layer having a thickness of 0.001 to 0.03 μ

m on said antireflection coating, which layer comprises a silane compound having a number average molecular weight of 5×

10² to 1×

10⁵ represented by the formula (I);

##STR4## wherein R_f is a straight or branched perfluoroalkyl group having 1 to 16 carbon atoms, X is an iodine atom or a hydrogen atom, Y is a hydrogen atom or a C_1-5 alkyl group, Z is a fluorine atom or a trifluoromethyl group, R¹ is a hydrolyzable group, R² is a hydrogen atom or an inactive monovalent organic group, a, b, c and d are the same or different and each an integer of 0 to 200, e is 0 or 1, m and n are the same or different and each 0, 1 or 2, and p is an integer of 1 to 10.

2. The antireflection filter according to claim 1, wherein, in the formula (1), R_f is --C₃ F₇, a is an integer of 1 to 50, b, c and d are 0, e is 1, Z is a fluorine atom and n is 0.

3. The antireflection filter according to claim 1, wherein p in the formula (1) is 1 (one).

4. The antireflection filter according to claim 1 which further comprises a hard coating layer between said substrate and said antireflection coating, wherein said hard coating layer is a coating layer obtained by polymerizing a polyfunctional polymerizable compound having at least two functional groups selected from the group consisting of an acryloyl group and a methacryloyl group by the irradiation of an actinic radiation, or by thermally crosslinking a silicone, melamine or epoxy-base crosslinkable resin raw material.

5. The antireflection filter according to claim 1, wherein said substrate has a thickness of 0.01 to 10 mm.

6. The antireflection filter according to claim 1, wherein said antireflection coating comprises at least two layers, and the layer of said coating which is farthest from said substrate comprises a material selected from the group consisting of silicon dioxide and metal oxides.

7. The antireflection filter according to claim 1, wherein the transparent substrate is an optical film or sheet having polarization properties.

8. The antireflection filter according to claim 1, wherein the transparent substrate comprises polyvinyl alcohol resin and is an iodine-containing or dye-containing polarized light film or sheet or laminate.

9. The antireflection filter according to claim 8, wherein the transparent substrate has a thickness of 0.01 to 10 mm.

10. A method for stain proofing an antireflection filter which comprises an antireflection coating on at least one surface of a transparent substrate in the form of a film or sheet, wherein said coating comprises an inorganic compound, said method comprising:

providing a stain proofing layer of a silane compound on said antireflection coating, wherein said silane compound has a number average molecular weight of 5×

10² to 1×

10⁵ represented by the formula (I);

##STR5## wherein R_f is a straight or branched perfluoroalkyl group having 1 to 16 carbon atoms, X is an iodine atom or a hydrogen atom, Y is a hydrogen atom or a C_1-5 alkyl group, Z is a fluorine atom or a trifluoromethyl group, R¹ is a hydrolyzable group, R² is a hydrogen atom or an inactive monovalent organic group, a, b, c and d are the same or different and each an integer of 0 to 200, e is 0 or 1, m and n are the same or different and each 0, 1 or 2, and p is an integer of 1 to 10.

11. The method according to claim 10, wherein said layer of the silane compound has a thickness of from 0.001 to 0.03 μ

m.

12. The method according to claim 10, wherein said silane compound is applied in the form of a solution with a concentration of 0.05 to 0.5 wt. %.

13. The method according to claim 12, wherein said solution is one in a perfluorohydrocarbon.

14. The method according to claim 10, wherein said antireflection coating comprises at least two layers, and the layer of said coating which is remotest from said substrate comprises a material selected from the group consisting of silicon dioxide and metal oxides.