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Holographic method for generating three dimensional conformal photo-lithographic masks

  • US 5,764,390 A
  • Filed: 03/27/1996
  • Issued: 06/09/1998
  • Est. Priority Date: 12/23/1994
  • Status: Expired due to Term
First Claim
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1. A system for producing a three-dimensional mask, the mask having a planar side and a three-dimensional side directly opposite the planar side for mating with a three-dimensional part to be treated, said system comprising:

  • means for defining feature areas on a surface of the three-dimensional part to be treated;

    means for generating information for forming a hologram including information that represents features relating to the feature areas defined by the defining means, the information included in the hologram defining features to be imaged onto the three-dimensional side of the mask for mating with the three-dimensional part to be treated;

    means for writing information generated by the generating means onto the planar side of the mask to form a hologram;

    means for irradiating light through the hologram on the planar side of the mask to expose a portion of material on the three-dimensional side of the mask in a pattern according to the hologram to create exposed and unexposed portions of the material; and

    means for removing one of the exposed or unexposed portions of the material provided on the three-dimensional side of the mask.

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