Device for forming deposited film

• US 5,769,950 A
• Filed: 05/25/1995
• Issued: 06/23/1998
• Est. Priority Date: 07/23/1985
• Status: Expired due to Term

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Sano, Masafumi, Tsuda, Hisanori, Takasu, Katsuji, Hirai, Yutaka
• Primary Examiner(s): BUEKER, RICHARD R
• Application Number:
  US08/450,624
• Time in Patent Office: 1,125 Days
• Field of Search: 118/719, 118/723 ME, 118/723 MR, 118/723 ER, 118/722, 118/724, 118/715, 118/725
• US Class Current: 118/715
• CPC Class Codes: C23C 16/4408 by purging residual gases from the reaction chamber or gas lines
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/48 by irradiation, e.g. photolysis, radiolysis, particle radiation
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating

Abstract

A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a deposited film on the substrate heated by said heating means in the reaction chamber, the decomposing means having a light source which irradiates at least one kind of light into the reaction chamber to decompose the starting gases.

Claims

1. A deposition film forming apparatus comprising:

a reaction chamber for housing a substrate on which a deposition film is to be formed;

starting gas introducing means including a plurality of mass flow controllers connected via gas lines to a plurality of starting gas sources for controlling the flow rates of starting gases from the plurality of starting gas sources, each mass flow controller corresponding to one of the plurality of starting gas sources;

a first line for introducing the starting gases into the reaction chamber;

a vent line; and

a plurality of first three-way valves provided between said first line and said vent line and the plurality of mass flow controllers for selectively introducing the flow rate controlled starting gases either into said first line or into said vent line;

a purge gas line for supplying a purge gas from a purge gas source to an upstream side of said plurality of mass flow controllers;

a plurality of second three-way valves provided between said purge gas line and said gas lines and said plurality of mass flow controllers for selectively introducing either the starting gases or the purge gas into said plurality of mass flow controllers;

evacuating means for evacuating the reaction chamber; and

decomposing means for decomposing the starting gases to form the deposition film on the substrate in the reaction chamber.

2. The apparatus according to claim 1, wherein said first plurality of three-way valves introduces corresponding starting gases alternately and intermittently into the reaction chamber.

3. The apparatus according to claim 1, wherein said decomposing means comprises a light source which irradiates at least one kind of light energy into said reaction chamber to decompose the starting gas.

4. The apparatus according to claim 1, further comprising a preliminary chamber for introduction of the substrate which is in communication with the reaction chamber via a conveying mechanism for conveying the substrate.

5. The apparatus according to claim 1, wherein said decomposing means comprises a plasma chamber for generating radical species which is in communication with said reaction chamber and introduces the generated radical species into said reaction chamber to decompose the starting gas.

6. The apparatus according to claim 1, wherein said starting gas introducing means comprises heating means for heating the starting gas to be introduced into said reaction chamber.

7. The apparatus according to claim 1, wherein said vent line is not connected to said reaction chamber.