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Baseband V-I probe

  • US 5,770,922 A
  • Filed: 07/22/1996
  • Issued: 06/23/1998
  • Est. Priority Date: 07/22/1996
  • Status: Expired
First Claim
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1. A plasma arrangement in which an RF power generator supplies an RF electrical wave in an RF frequency range to a power input of a plasma chamber within which said RF electrical wave produces a plasma, and in which a plasma probe picks up an RF voltage waveform of said electrical wave and an RF current waveform of said electrical wave;

  • comprising the improvement wherein said plasma probe comprises a controllable local oscillator providing a local oscillator signal;

    a voltage signal mixer having inputs receiving said RF voltage waveform and said local oscillator signal, respectively, and an output providing a baseband voltage signal;

    a current signal mixer having inputs receiving said RF current waveform and said local oscillator signal, respectively, and having an output providing a baseband current signal;

    an A/D converter having a first channel input to which said baseband voltage signal is applied, a second channel input to which said baseband current signal is applied, and a serial output providing a time-synchronous serial digital signal containing digital representations of said baseband voltage waveform and said baseband current waveform;

    a digital signal processor having an input coupled to the serial output of said A/D converter, said digital signal processor being suitably programmed to compute amplitude and relative phase of said voltage baseband signal and said current baseband signal;

    external interface means for providing an output determination based on said amplitudes and relative phase; and

    local oscillator interface means coupled to said digital signal processor and to said local oscillator permitting said digital signal processor to control the frequency of said local oscillator.

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