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Film comprising silicon dioxide as the main component and method for its productiion

  • US 5,772,862 A
  • Filed: 04/27/1995
  • Issued: 06/30/1998
  • Est. Priority Date: 03/03/1988
  • Status: Expired due to Fees
First Claim
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1. A target for sputtering comprising Si, as the main component, and Zr, wherein the amount of zirconium is at least 4 atoms relative to 96 atoms of Si.

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