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Process for recovering semiconductor industry cleaning compounds

  • US 5,779,763 A
  • Filed: 03/07/1997
  • Issued: 07/14/1998
  • Est. Priority Date: 03/07/1997
  • Status: Expired due to Term
First Claim
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1. A process for separating a perfluoro compound from a second gas in a gas mixture, said process comprising the steps of:

  • (a) providing a first membrane having a first feed side and a first permeate side, and being selective for said second gas over said perfluoro compound;

    (b) passing said gas mixture across said first feed side;

    (c) withdrawing from said first feed side a first residue stream depleted in said second gas and enriched in said perfluoro compound compared with said gas mixture;

    (d) withdrawing from said first permeate side a first permeate stream enriched in said second gas and depleted in said perfluoro compound compared with said gas mixture;

    (e) providing a second membrane having a second feed side and a second permeate side, and being selective for said second gas over said perfluoro compound;

    (f) passing said first residue stream across said second feed side;

    (g) withdrawing from said second feed side a second residue stream depleted in said second gas and enriched in said perfluoro compound compared with said first residue stream;

    (h) withdrawing from said second permeate side a second permeate stream enriched in said second gas and depleted in said perfluoro compound compared with said first residue stream;

    (i) passing said second residue stream to a condensation step carried out at a temperature no lower than about -30°

    C. to liquefy at least a portion of said second residue stream, thereby forming a liquefied perfluoro compound product;

    (j) recirculating said second permeate stream to said first feed side.

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