Accelerometers using silicon on insulator technology

• US 5,780,885 A
• Filed: 08/15/1996
• Issued: 07/14/1998
• Est. Priority Date: 12/28/1992
• Status: Expired due to Term

• Current Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Original Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Inventors: Diem, Bernard, Delaye, Marie-Therese
• Primary Examiner(s): MINTEL, WILLIAM A
• Application Number:
  US08/698,066
• Time in Patent Office: 698 Days
• Field of Search: 257/417, 257/418, 257/419, 257/420, 257/254, 73/DIG. 1, 73/514.02, 73/DIG. 4, 73/514.21, 73/514.22, 73/514.23, 73/514.24, 73/514.34, 73/514.36, 73/514.37, 73/514.38
• US Class Current: 257/254
• CPC Class Codes: B81B 2201/0235 Accelerometers
• CPC Class Codes: B81B 2203/0109 Bridges
• CPC Class Codes: B81B 2203/053 Translation according to an axis perpendicular to the substrate
• CPC Class Codes: B81B 3/0051 For defining the movement, i.e. structures that guide or limit the movement of an element mechanical arrangements for preventing or damping vibration or shock H01H3/60
• CPC Class Codes: B81C 1/0015 Cantilevers switches using MEMS H01H1/0036; electrostatic relays using micromechanics H01H59/0009; microelectro-mechanical resonators H03H9/02244
• CPC Class Codes: B81C 2201/0166 by ion implantation
• CPC Class Codes: B81C 2201/0177 Epitaxy, i.e. homo-epitaxy, hetero-epitaxy, GaAs-epitaxy
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 2015/0814 for translational movement of the mass, e.g. shuttle type
• CPC Class Codes: G01P 2015/0828 the mass being of the paddle type being suspended at one of its longitudinal ends
• CPC Class Codes: Y10S 73/01 Vibration
• CPC Class Codes: Y10S 73/04 Piezoelectric

Abstract

Process for the production of accelerometers using the silicon on insulator method. The process comprises the following stages: a) producing a conductive monocrystalline silicon film on a silicon substrate and separated from the latter by an insulating layer; b) etching the silicon film and the insulating layer up to the substrate in order to fix the shape of the mobile elements and the measuring device; c) producing electric contacts for the measuring devices; d) partial elimination of the insulating layer in order to free the mobile elements, the remainder of the insulating layer rendering integral the substrate and the moving elements.

Claims

1. An accelerometer comprising:

a monocrystalline silicon film;

a silicon substrate;

an insulating layer; and

moving elements etched through said monocrystalline silicon film;

said insulating layer separating the monocrystalline silicon film from the silicon substrate, and portions of the insulating film being removed in order to free the moving elements, wherein at least one first moving element of said monocrystalline silicon film has a sensitive axis perpendicular to the substrate and at least one second moving element of said monocrystalline silicon film has a sensitive axis parallel to the substrate.

2. An accelerometer according to claim 1, wherein the moving elements comprise a seismic mass.

3. An accelerometer according to claim 2, further comprising fixed support elements, insulated from the substrate and beams connecting the seismic mass to the fixed support elements.

4. An accelerometer according to claim 1, further comprising measuring means for measuring displacements of said moving elements, said measuring means being integrated onto the substrate.

5. An accelerometer according to claim 1, wherein the monocrystalline slicon film is of an N type.

6. An accelerometer according to claim 4, wherein the measuring means comprises a comb-shaped electrostatic screen.

7. An accelerometer comprising:

a monocrystalline silicon film on a silicon substrate, said monocrystalline silicon film being separated from the silicon substrate by an insulating layer; and

at least one first moving element having a sensitive axis perpendicular to the substrate and at least one second moving element having a sensitive axis parallel to the substrate.