Position resolution of an interferometrially controlled moving stage by regression analysis

• US 5,784,166 A
• Filed: 04/03/1996
• Issued: 07/21/1998
• Est. Priority Date: 04/03/1996
• Status: Expired due to Term

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Sogard, Michael R.
• Primary Examiner(s): Turner, Samuel A.
• Application Number:
  US08/626,863
• Time in Patent Office: 839 Days
• Field of Search: 356/358, 356/363, 356/400, 356/401, 250/559.29, 250/559.3, 250/548, 355/50, 355/53
• US Class Current: 356/509
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 9/70 for microlithography measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775

Abstract

A method and apparatus for achieving high position resolution of a moving stage in a lithographic system utilized for the manufacture of semiconductor integrated circuits. A series of values of the stage position are measured using an interferometric system, and a present position of the stage is estimated using regression analysis applied to a selected number of the series of measured values. The resulting predicted position is of higher resolution than a single stage position measurement of the interferometric system.

Claims

1. A method of achieving high position resolution in a precision motion system having at least one moving stage, comprising the steps of:

measuring a series of positions of said at least one moving stage; and

estimating a present position of said at least one moving stage using a selected number of the series of measured positions of said at least one moving stage.

2. The method of claim 1, wherein said step of measuring comprises a step of measuring interferometrically.

3. The method of claim 2, wherein said step of estimating a present position of said at least one moving stage comprises a step of estimating using regression analysis.

4. The method of claim 3, further comprising the step of controlling the movement of said at least one moving stage with a first servo system.

5. The method of claim 4, further comprising the step of providing said first servo system a first movement profile to control the movement of said at least one moving stage.

6. The method of claim 4, wherein said regression analysis is a linear regression.

7. The method of claim 6, wherein said at least one moving stage is a precision stage, and wherein said regression analysis is performed for time periods shorter than an update time of said first servo system.

8. The method of claim 5, further comprising the steps of:

providing said estimated present position of said at least one moving stage to said first servo system;

comparing said estimated present position of said at least one moving stage with a first position defined by said first movement profile; and

correcting the movement of said at least one moving stage, whereby a next estimated present position substantially coincides with a second position defined by said first movement profile.

9. The method of claim 8 wherein said system has at least a second moving stage, and further comprising the steps of:

measuring a series of positions of said at least a second moving stage; and

estimating a present position of said at least a second moving stage using a selected number of the series of measured positions of said at least a second moving stage.

10. The method of claim 9, wherein said step of measuring a series of positions of said at least a second moving stage comprises a step of measuring interferometrically.

11. The method of claim 10, wherein said step of estimating a present position of said at least a second moving stage comprises a step of estimating using regression analysis.

12. The method of claim 11, further comprising a step of controlling the movement of said at least a second moving stage with a second servo system.

13. The method of claim 12, further comprising the steps of:

providing said second servo system a second movement profile to control the movement of said at least a second moving stage;

comparing said estimated present position of said at least a second moving stage with a first position defined by said second movement profile; and

correcting the movement of said at least a second moving stage, whereby the estimated next present position of said at least a second moving stage substantially coincides with a second position defined by said second movement profile.

14. The method of claim 13, wherein said step of providing a second movement profile comprises the step of providing a second movement profile that is a function of said first movement profile.

15. The method of claim 14, further comprising a step of imaging portions of a mask on said at least one moving stage wherein said at least one moving stage is a mask stage in a lithographic system onto a wafer disposed on said at least a second moving stage wherein said at least a second moving stage is a wafer stage in said lithographic system with a lens system disposed between said mask stage and said wafer stage.

16. The method of claim 15, further comprising the step of selectively adjusting a magnification of said lens system.

17. The method of claim 16, wherein said steps of providing first and second movement profiles comprise the steps of providing first and second movement profiles which comprise displacement versus time profiles thereby defining a mask stage velocity and a wafer stage velocity at each point of said first movement profile and second movement profile.

18. The method of claim 17, wherein said step of providing a second movement profile comprises the step of providing a second movement profile that is a function of said first movement profile, wherein said function is determined by said selectively adjusted magnification of said lens system.

61. The method of claim 1, wherein the measurement of the series of positions is made at regular time intervals while said at least one moving stage is moving, and wherein said estimate of said present position is made while said at least one moving stage is moving.

19. An apparatus for achieving high position resolution, comprising:

at least one moving stage;

a first measurement system located to measure a series of positions of said at least one moving stage; and

an estimation system connected to said first measurement system to estimate a present position of said at least one moving stage using a selected number of the series of measured positions of said at least one moving stage.

20. The apparatus of claim 19, wherein said first measurement system comprises a first interferometer system.

21. The apparatus of claim 20, wherein said estimation system is a microprocessor controller wherein said microprocessor controller estimates a present position of said at least one moving stage

using regression analysis.

22. The apparatus of claim 21, further comprising a first control system coupled to said at least one moving stage and to said estimation system to control the movement of said at least one moving stage.

23. The apparatus of claim 22, wherein said first control system comprises a first servo system wherein said first servo system controls the movement of said at least one moving stage in accordance with a first movement profile.

24. The apparatus of claim 23, wherein said regression analysis is a linear regression.

25. The apparatus of claim 24, wherein said at least one moving stage is a precision stage, and wherein said regression analysis is performed for time periods shorter than an update time of said first servo system.

26. The apparatus of claim 23, wherein said first servo system compares said present predicted position of said at least one moving stage with a first position defined by said first movement profile and corrects the movement of said at least one moving stage, whereby a next estimated present position of said at least one moving stage substantially coincides with a second position defined by said first movement profile.

27. The apparatus of claim 26, further comprising:

at least a second moving stage located space apart from said at least a first moving stage;

a second measuring system located adjacent said at least a second moving stage to measure a series of positions of said at least a second moving stage; and

wherein said microprocessor controller estimates a present position of said at least a second moving stage using a selected number of the series of measured positions of said at least a second moving stage.

28. The apparatus of claim 27, wherein said second measurement system comprises a second interferometer system.

29. The apparatus of claim 28, wherein said microprocessor controller estimates a present position of said at least a second moving stage using regression analysis.

30. The apparatus of claim 29, further comprising a second control system coupled to said at least a second moving stage and said a second measuring system to control the movement of said at least a second moving stage.

31. The apparatus of claim 30, wherein said second control system comprises a second servo system wherein said second servo system controls the movement of said at least a second moving stage in accordance with a second movement profile.

32. The apparatus of claim 31, wherein said second servo system compares said present predicted position of said at least a second moving stage with a first position defined by said second movement profile and corrects the movement of said at least a second moving stage, whereby a next estimated present position of said at least a second moving stage substantially coincides with a second position defined by said second movement profile.

33. The apparatus of claim 32, wherein:

said at least one moving stage is a mask stage in a lithographic system; and

said at least a second moving stage is a wafer stage in said lithographic system.

34. The apparatus of claim 33, wherein said second movement profile is a function of said first second profile.

35. The apparatus of claim 34, further comprising a lens system disposed adjacent to said wafer stage.

36. The apparatus of claim 35, wherein said lens system has a selected magnification.

37. The apparatus of claim 36, wherein said lens system is disposed between said mask stage and said wafer stage.

38. The apparatus of claim 37, wherein said selected magnification of said lens system determines said function between said first movement profile and said second movement profile.

39. The apparatus of claim 38, wherein said first movement profile and said second movement profile comprise displacement versus time profiles thereby defining said wafer stage velocity and said mask stage velocity at each point of said first and second movement profiles.

62. The apparatus of claim 19, wherein said first measurement system measures a series of positions at regular time intervals while said at least one moving stage is moving, and wherein said estimation system estimates a present position while said at least one moving stage is moving.

40. An apparatus for achieving high position resolution, comprising:

at least one moving stage;

means for measuring a series of positions of said at least one moving stage; and

means for estimating a present position of said at least one moving stage using a selected number of the series of measured positions of said at least one moving stage.

41. The apparatus of claim 40, wherein said means for estimating uses regression analysis to estimate the present position of said at least one moving stage.

42. The apparatus of claim 41, further comprising means for controlling the movement of said at least one moving stage.

43. The apparatus of claim 42, wherein said means for controlling controls the movement of said at least one moving stage in accordance with a first movement profile.

44. The apparatus of claim 42, wherein said regression analysis is a linear regression.

45. The apparatus of claim 44, wherein said at least one moving stage is a precision stage, said means for controlling includes a servo system, and wherein said regression analysis is performed for time periods shorter than an update time of said servo system.

46. The apparatus of claim 43, further comprising:

means for comparing said estimated present position of said at least one moving stage with a first position defined by said first movement profile; and

means for correcting the movement of said at least one moving stage whereby a next estimated present position of said at least one moving stage substantially coincides with a second position defined by said first movement profile.

47. The apparatus of claim 46, further comprising:

at least a second moving stage;

means for measuring a series of positions of said at least a second moving stage; and

means for estimating a present position of said at least a second stage using a selected number of the series of measured positions of said at least a second moving stage.

48. The apparatus of claim 47, wherein said means for estimating a present position of said at least a second stage uses regression analysis to estimate said present position of said at least a second moving stage.

49. The apparatus of claim 48, further comprising means for controlling the movement of said at least a second moving stage.

50. The apparatus of claim 49, wherein said means for controlling the movement of said at least a second moving stage controls the movement of said at least a second moving stage in accordance with a second movement profile.

51. The apparatus of claim 50, further comprising:

means for comparing said estimated present position of said at least a second moving stage with a first position defined by said second moving profile; and

means for correcting the movement of said at least a second moving stage whereby a next estimated present position of said at least a second moving stage substantially coincides with a second position defined by said second movement profile.

52. The apparatus of claim 51, wherein said first movement profile is a function of said second movement profile.

53. The apparatus of claim 52, wherein:

said means for controlling the movement of said at least one moving stage comprises a first servo system; and

said means for controlling the movement of said at least a second moving stage comprises a second servo system.

54. The apparatus of claim 53, wherein:

said at least one moving stage comprises a mask stage in a lithographic system; and

said at least a second moving stage comprises a wafer stage in said lithographic system.

55. The apparatus of claim 54, further comprising means for transferring an image of a mask disposed on said mask stage to a wafer disposed on said wafer stage.

56. The apparatus of claim 55, wherein said means for transferring comprises a lens system with a selected magnification.

57. The apparatus of claim 56, wherein said selected magnification determines said function.

58. The apparatus of claim 57, wherein said first movement profile and said second movement profile comprise displacement versus time profiles thereby defining said wafer stage velocity and said mask stage velocity at each point of said first and second movement profiles respectively.

59. The apparatus of claim 58, wherein said means for estimating a present position of said at least one moving stage and said means for estimating a present position of said at least a second stage comprises a microprocessor controller.

60. The apparatus of claim 59, wherein:

said means for measuring a series of positions of said at least one moving stage comprises a first interferometer system; and

said means for measuring a series of positions of said at least a second moving stage comprises a second interferometer system.

63. The apparatus of claim 40, wherein said means for measuring a series of positions of said at least one moving stage measures at a regular time interval while said at least one moving stage is moving, and wherein said means for estimating a present position of said at least one moving stage estimates while said at least one moving stage is moving.