Electrically tunable coatings

• US 5,786,068 A
• Filed: 06/07/1995
• Issued: 07/28/1998
• Est. Priority Date: 05/03/1991
• Status: Expired due to Term

• Current Assignee: Fleet National Bank (Bank of America Corp.), Sulzer Metaplas GmbH
• Original Assignee: Advanced Refractory Technologies, Inc.
• Inventors: Goel, Arvind, Dorfman, Veniamin F.
• Primary Examiner(s): Ryan, Patrick
• Assistant Examiner(s): MULVANEY, ELIZABETH EVANS
• Application Number:
  US08/483,848
• Time in Patent Office: 1,147 Days
• Field of Search: 361/502, 428/209, 428/210, 428/688, 428/689, 428/701, 428/702, 428/698, 428/408
• US Class Current: 428/209
• CPC Class Codes: A61F 2310/00574 Coating or prosthesis-covering structure made of carbon, e.g. of pyrocarbon
• CPC Class Codes: A61L 27/30 Inorganic materials
• CPC Class Codes: A61L 27/303 Carbon
• CPC Class Codes: A61L 27/306 Other specific inorganic materials not covered by A61L27/303 - A61L27/32
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C04B 41/5002 Diamond
• CPC Class Codes: C04B 41/85 with inorganic materials
• CPC Class Codes: C23C 14/0036 Reactive sputtering
• CPC Class Codes: C23C 14/06 characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 14/0605 Carbon
• CPC Class Codes: C23C 14/221 Ion beam deposition C23C14/46, C23C14/48 take precedence
• CPC Class Codes: C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
• CPC Class Codes: C23C 16/4483 using a porous body
• CPC Class Codes: C23C 16/4485 by evaporation without using carrier gas in contact with the source material C23C16/4486 takes precedence
• CPC Class Codes: C23C 16/45568 Porous nozzles
• CPC Class Codes: C23C 16/503 using dc or ac discharges
• CPC Class Codes: F42B 12/80 Coatings
• CPC Class Codes: G02B 1/111 using layers comprising organic materials
• CPC Class Codes: G02B 1/16 having an anti-static effect, e.g. electrically conducting coatings
• CPC Class Codes: G11B 5/8408 protecting the magnetic layer
• CPC Class Codes: Y10T 428/24917 : including metal layer
• CPC Class Codes: Y10T 428/24926 : including ceramic, glass, porcelain or quartz layer
• CPC Class Codes: Y10T 428/30 : Self-sustaining carbon mass or layer with impregnant or other layer

Abstract

An electrically tunable coating and method for its fabrication and deposition comprising, as a coating on a substrate, a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups 1-7b and 8 of the periodic table.

Claims

1. An electrically tunable coating having a predetermined resistivity formed from interpenetrating networks, comprising a first network of bonded carbon in a diamond-like carbon network stabilized by hydrogen, a second silicon network stabilized by oxygen and, optionally, additional networks made from dopant elements, or dopant compounds containing elements from groups 1-7b and 8 of the periodic table.

2. The coating according to claim 1 wherein the carbon content is greater than about 40 atomic % of the coating, the hydrogen content is from about 1 atomic % up to about 40 atomic % of the carbon, and the sum of the silicon, oxygen and dopants together is greater than about 2 atomic % of the coating.

3. The coating according to claim 1 wherein the carbon, hydrogen, silicon and oxygen are obtained from the decomposition of an organosiloxane having from about 1 to about 10 silicon atoms.

4. The coating according to claim 3 wherein the organosiloxane is polyphenylmethylsiloxane.

5. The coating according to claim 1 wherein the carbon content is from about 40 wt. % to about 98 wt. %.

6. The coating according to claim 1 wherein the carbon content is from about 50 wt. % to about 98 wt. %.

7. The coating according to claim 1 wherein the carbon to silicon weight ratio is from about 2:

1 to about 8;

1.

8. The coating according to claim 1 wherein the silicon to oxygen weight ratio is from about 0.5:

1 to about 3;

1.

9. The coating according to claim 1 wherein the coating is deposited on a non-metal substrate.

10. The coating according to claim 1 wherein the dopant elements are selected from the group consisting of B, Li, Na, Si, Ge, Te, O, Mo, W, Ta, Nb, Pd, Ir, Pt, V, Fe, Co, Mg, Mn, Ni, Ti, Zr, Cr, Re, Hf, Cu, Al, N, Ag and Au.

11. The coating according to claim 1 wherein the coating is a dielectric coating.

12. The coating according to claim 1 wherein the coating is a conductive coating.

13. The coating according to claim 1 wherein the coating has a surface resistivity value of from about 10^-4 Ohm·

cm to about 10¹⁵ Ohm·

cm.

14. An anti-electrostatic coating formed from the coating of claim 1.

15. An ultracapacitor having multiple layers, one or more of the layers formed from the coating of claim 1.

27. An ultracapacitor having multiple layers, one or more of the layer formed from the material of claim 2.

16. An electrically tunable material with selectively modified resistivity made from a substrate and an electrically tunable coating, said coating made from a class of diamond-like solid state materials formed from interpenetrating networks, comprising a first network of bonded carbon in a diamond-like carbon network stabilized by hydrogen, a second silicon network stabilized by oxygen and, optionally, additional networks made from dopant elements, or dopant compounds containing elements from groups 1-7b and 8 of the periodic table.

17. The material according to claim 16 wherein the carbon content is greater than about 40 atomic % of the coating, the hydrogen content is from about 1 atomic % up to about 40 atomic % of the carbon, and the sum of the silicon, oxygen and dopants together is greater than about 2 atomic % of the coating.

18. The material according to claim 16 wherein the carbon, hydrogen, silicon and oxygen are obtained from the decomposition of an organosiloxane having from about 1 to about 10 silicon atoms.

19. The material according to claim 18 wherein the organosiloxane is polyphenylmethylsiloxane.

20. The material according to claim 16 wherein the carbon to silicon weight ratio is from about 2:

1 to about 8;

1.

21. The material according to claim 16 wherein the silicon to oxygen weight ration is from about 0.5:

1 to about 3;

1.

22. The material according to claim 16 wherein the dopant elements are selected from the group consisting of B, Li, Na, Si, Ge, Te, O, Mo, W, Ta, Nb, Pd, Ir, Pt, V, Fe, Co, Mg, Mn, Ni, Ti, Zr, Cr, Re, Hf, Cu, Al, N, Ag and Au.

23. The material according to claim 16 wherein the coating is a dielectric coating.

24. The material according to claim 16 wherein the coating is a conductive coating.

25. The material according to claim 16 wherein the coating has a surface resistivity value of from about 10^-4 Ohm·

cm to about 10¹⁵ Ohm·

cm.

26. An anti-electrostatic material formed from the material of claim 16.

28. A rectifying contact for Schottky barriers formed from the material of claim 16.

29. A thermal resistor for inkjet printers formed from the material of claim 16.