Process simulation apparatus and method for selecting an optimum simulation model for a semiconductor manufacturing process
First Claim
1. A process simulation apparatus for simulating a manufacturing process of a semiconductor device which manufacturing process comprises various processes including an ion implantation process and a diffusion process, said process simulation apparatus comprising:
- reading means for inputting process sequence data which represents conditions of a two-dimensional simulation for each process;
a memory unit storing said process sequence data input from said reading means and also storing condition information for various simulation models usable for each process;
model selecting means for selecting an optimum simulation model used for simulating each process so as to perform a two-dimensional simulation simulating each process, said model selecting means comparing said process sequence data and said condition information and selecting a simulation model which most accurately simulates an actual process based on the comparison; and
simulation means for simulating said semiconductor device manufacturing process by a two-dimensional simulation method using said optimum simulation model selected by the model selecting means to produce simulated results of said device manufacturing process.
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Abstract
A process simulation apparatus simulates a manufacturing process of a semiconductor device which manufacturing process comprising various processes including an ion implantation process and a diffusion process. Process sequence data which represents conditions of a two-dimensional simulation for each process is input to a memory unit. The memory unit stores the process sequence data and also stores condition information for various simulation models usable for each process. An optimum simulation model for each process is selected for performing a two-dimensional simulation for each process. The semiconductor device manufacturing process is simulated by a two-dimensional simulation method using the selected optimum simulation model.
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Citations
16 Claims
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1. A process simulation apparatus for simulating a manufacturing process of a semiconductor device which manufacturing process comprises various processes including an ion implantation process and a diffusion process, said process simulation apparatus comprising:
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reading means for inputting process sequence data which represents conditions of a two-dimensional simulation for each process; a memory unit storing said process sequence data input from said reading means and also storing condition information for various simulation models usable for each process; model selecting means for selecting an optimum simulation model used for simulating each process so as to perform a two-dimensional simulation simulating each process, said model selecting means comparing said process sequence data and said condition information and selecting a simulation model which most accurately simulates an actual process based on the comparison; and simulation means for simulating said semiconductor device manufacturing process by a two-dimensional simulation method using said optimum simulation model selected by the model selecting means to produce simulated results of said device manufacturing process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A process simulation method for simulating a manufacturing process of a semiconductor device which manufacturing process comprises various processes including an ion implantation process and a diffusion process, said process simulation method comprising the steps of:
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inputting process sequence data which represents conditions of a two-dimensional simulation for each process into reading means; storing said process sequence data input from said reading means and also storing condition information for various simulation models usable for each process in a memory unit; comparing said process sequence data and said condition information; selecting an optimum simulation model used for simulating each process for performing a two-dimensional simulation for simulating each process, said selecting step selecting a simulation model which most accurately simulates an actual process, based on the result of said comparison; and simulating said semiconductor device manufacturing process by a two-dimensional simulation method using said optimum simulation model selected in the step c) to produce simulated results of said device manufacturing process. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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Specification