Plating of noble metal electrodes for DRAM and FRAM

• US 5,789,320 A
• Filed: 04/23/1996
• Issued: 08/04/1998
• Est. Priority Date: 04/23/1996
• Status: Expired due to Term

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Schrott, Alejandro Gabriel, Grill, Alfred, Saenger, Katherine Lynn, Andricacos, Panayotis Constantinou, Patel, Vishnubhai Vitthalbhai, Kotecki, David Edward, Comfort, James Hartfiel
• Primary Examiner(s): Bowers, Jr., Charles L.
• Assistant Examiner(s): Berry, Renee R.
• Application Number:
  US08/636,456
• Time in Patent Office: 833 Days
• Field of Search: 437/189, 437/230, 438/396, 438/397, 438/643, 438/653, 438/660, 438/739, 438/650, 438/678
• US Class Current: 438/678
• CPC Class Codes: H01L 28/60 Electrodes
• CPC Class Codes: H10B 12/03 Making the capacitor or connections thereto

Abstract

Noble metal plating on a preexisting seed layer is used in the fabrication of electrodes for DRAM and FRAM. The plating may be spatially selective or nonselective. In the nonselective case, a blanket film is first plated and then patterned after deposition by spatially selective material removal. In the selective case, the plated deposits are either selectively grown in lithographically defined areas by a through-mask plating technique, or selectively grown as a conformal coating on the exposed regions of a preexisting electrode structure. A diamond-like carbon mask can be used in the plating process. A self-aligned process is disclosed for selectively coating insulators in a through-mask process.

Claims

1. A method for forming a capacitor for a semiconductor device, said method comprises the steps of:

plating a noble metal electrode, said plated noble metal electrode being selected from the group consisting of pure noble metals and alloys of noble metals;

depositing a high-epsilon or ferromagnetic material on at least some surfaces of said plated noble metal electrode; and

depositing a counterelectrode on said high-epsilon or ferromagnetic material.

2. The method of claim 1 wherein said noble metal electrodes consist of one or more layers of pure noble metals, alloys of noble metals, or a combination thereof.

3. The method of claim 1 wherein the plating step is nonselective and comprises the steps of plating a blanket film of said noble metals and then patterning the film after deposition.

4. The method of claim 3 wherein the plating step is part of a Damascene process comprising the steps of:

a) forming a patterned masking layer, said masking layer containing open regions or cavities;

b) blanket depositing a seed layer or plating base on said masking layer and openings contained therein;

c) plating a film of noble metals as a blanket layer over the patterned mask, completely filling the openings contained therein;

d) polishing away any plated or seed layer material remaining above the top surface of the mask.

5. The method of claim 1 wherein the plating step is selective and the plated deposits are selectively grown in lithographically defined areas by through-mask plating.

6. The method of claim 1 wherein the plating step is selective and the plated deposits are conformally grown as a coating on a preexisting electrode structure.

7. The method of claim 5 wherein said plating comprises the steps of:

a) blanket deposition of a seed layer or plating base;

b) application and patterning of a first disposable material to cover regions where plating is not desired;

c) plating regions not covered by the first disposable material with an electrically conductive material;

d) removing the first disposable material; and

e) removing those portions of the plating base exposed by removal of the first disposable material.

8. The method of claim 7 wherein the first disposable material is selected from the group consisting of a photoresist, x-ray resist, or e-beam or ion-beam resist.

9. The method of claim 7 wherein the first disposable material is an inorganic material selected from the group consisting of oxides or nitrides.

10. The method of claim 7 wherein the first disposable material is diamond-like carbon, said diamond-like carbon being selected from the group consisting of hydrogenated or non-hydrogenated amorphous carbon (DLC), fluorinated amorphous carbon (F-DLC), or DLC or F-DLC containing one or more additives selected from the group containing oxygen, silicon, nitrogen, and all metallic elements.

11. The method of claim 7 wherein those portions of the plating base exposed by removal of the first disposable material are removed by an etching process selected from the group consisting of ion beam sputtering, plasma etching, RIE, ion-assisted etching, chemical etching, and wet etching.

12. The method of claim 7 wherein those portions of the plating base exposed by removal of the first disposable material are made to become insulating by a process of oxidation or anodization.

20. The method of claim 1 wherein said noble metals are plated by a method selected from the group consisting of electrolytic, electroless, or a combination thereof.

21. The method of claim 1 wherein said pure noble metals are selected from the group consisting of Au, Pt, Pd, Ir, Rh, Ru, and Os.

22. The method of claim 1 wherein said alloys are alloys of noble metals or alloys of noble and nonnoble metals.

23. The method of claim 1 wherein said alloys are selected from the group consisting of PtIr, PdIr, PtCu, PtPd, PdNi and PdCo.

26. The method of claim 6 wherein the preexisting electrode structure is deposited by plating.

27. The method of claim 7 wherein the electrically conductive material is the same as the plating base material.

28. The method of claim 7 wherein the electrically conductive material is different from the plating base or seed layer material.

13. A method for plating onto a substrate to provide a pattern of conductive materials thereon comprising the steps of:

a) depositing a blanket layer of a first conductive material on a substrate;

b) applying a DLC mask layer on said blanket layer;

c) patterning said DLC mask layer to provide exposed areas of said blanket layer

d) plating said exposed areas of said blanket layer with a second conductive material to form a pattern of conductive features;

e) removing the DLC mask layer to expose areas of said first conductive material; and

f) removing said exposed areas of said first conductive material.

14. The method according to claim 13, wherein the plating step is selective and the plated deposits are selectively grown in lithographically defined areas by a through-mask plating process.

15. The method according to claim 13, wherein the plating is part of a Damascene-type plating process, including the steps of:

a) forming a patterned DLC masking layer, said DLC masking layer containing open regions or cavities;

b) blanket depositing a seed layer on said DLC masking layer and openings contained therein;

c) plating a metal film as a blanket layer over the patterned DLC mask, completely filling the openings contained therein;

d) polishing away any plated or seed layer material remaining above the top surface of the DLC mask.

16. The method according to claim 13, wherein the plating is electroless and includes the steps of:

a) forming a patterned DLC masking layer, said DLC masking layer containing open regions or cavities;

b) selectively depositing a seed layer on the interior surfaces of said cavities;

c) selectively filling said cavities with metal by electroless plating.

17. The method of claim 13 wherein the DLC patterning comprises the steps of:

a) depositing an adhesion layer on a substrate, said substrate optionally coated with a seed layer;

b) depositing the desired thickness of said DLC mask layer on said substrate;

c) depositing a thin layer of a hard mask material on said DLC layer;

d) applying, exposing and developing a layer of photoresist on said hard mask layer;

e) patterning the hard mask by reactive ion etching, using the photoresist as a mask;

f) patterning the DLC layer using the hard mask as a mask, stopping on the adhesion layer;

g) removing the exposed adhesion layer; and

h) cleaning the exposed substrate or seed layer surface.

18. A self-aligned process for capping the pattern of conductive features of claim 13 with an identically patterned dielectric, said process comprising the steps of:

a) depositing a blanket layer of a first conductive material onto a substrate;

b) applying and patterning a first disposable material to cover regions where plating is not desired, the thickness of said first disposable material being approximately equal to the sum of the desired electrode and cap layer thicknesses;

c) plating electrode material to the desired thickness;

d) depositing the desired thickness of cap dielectric as a blanket film;

e) planarizing the cap dielectric by chemical mechanical polishing, stopping when the first disposable material is exposed; and

f) selective removal of the newly exposed first disposable material and those portions of the plating base previously under the mask.

19. The method of claim 18 wherein DLC is the first disposable material, with the cap dielectric selected from the group of materials consisting of SiO₂, SiN_x, or other high-epsilon or low-epsilon dielectric material.

24. The method of claim 13 wherein said plating is selected from the group consisting of electrolytic, electroless or a combination thereof.

25. The method of claim 13 wherein said second conductive material is selected from the groups of metals, (a) Au, Pt, Pd, Ir, Rh, Ru and Os, (b) alloys of noble metals or alloys of noble and non-noble metals, (c) PtIr, PdIr, PtCu, PtPd, PdNi and PdCo, plus copper and alloys of copper with any of the elements Ag, Zn, Cd, Au, Pd, Hg, Pt, In, Ni, B, Sn, Co, Cr, Ge, and Pb, alone or in combination.

29. The method of claim 13 wherein said DLC mask is a material selected from the group consisting of hydrogenated or non-hydrogenated amorphous carbon (DLC), flourinated amorphous carbon (F-DLC), or DLC or F-DLC containing one or more additives selected from the group consisting of oxygen, silicon, nitrogen and all metallic elements.