Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability
First Claim
1. An apparatus for etching a device having a flow of a plasma and preventing the undesirable deposition of a film comprising:
- a source of fluorocarbon gas;
an etching chamber having one of a surface defining the etching chamber and a surface disposed in said etching chamber;
means for heating said surface to and maintaining said surface at a temperature between 290°
C. to 310°
C. to impede the formation of a deposition film on said surface; and
means for generating a plasma from the source fluorocarbon gas.
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Accused Products
Abstract
The present invention relates to a method and apparatus for etching semiconductor devices where the undesirable deposition of films on the internal surfaces of the apparatus are prevented during the etching process. The system for etching devices provides an etching chamber having a deposition resistant surface, a holder for holding the device to be etched, and a heater for heating the deposition resistant surface to a temperature between 100° C. to 600° C. to impede the formation of films on the walls of the chamber. The etching system may further include the deposition resistant surface surrounding the holder while not interfering with the plasma used to etch the substrate.
192 Citations
25 Claims
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1. An apparatus for etching a device having a flow of a plasma and preventing the undesirable deposition of a film comprising:
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a source of fluorocarbon gas; an etching chamber having one of a surface defining the etching chamber and a surface disposed in said etching chamber; means for heating said surface to and maintaining said surface at a temperature between 290°
C. to 310°
C. to impede the formation of a deposition film on said surface; andmeans for generating a plasma from the source fluorocarbon gas. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 14, 15, 17, 18, 19, 21, 22, 24, 25)
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12. In a system for etching a device having a flow of a plasma, an apparatus for preventing the undesirable deposition of a film comprising:
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an etching chamber having one of a surface defining the etching chamber and a surface disposed in said etching chamber; means for heating said surface to a temperature between 200°
C. to 325°
C. to impede the formation of a deposition film on said surface; anda plasma source having a resonance frequency biasing. - View Dependent Claims (13)
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16. In a system having a flow of a plasma for etching a device, an apparatus for preventing the undesirable deposition of a film comprising:
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an etching chamber having a wall defining the etching chamber, said wall having a surface coated with Y2 O3 ; and means for heating said surface to a temperature between 200°
C. to 325°
C. to impede the formation of a deposition film on said surface.
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20. In a system having a flow of a plasma for etching a device, an apparatus for preventing the undesirable deposition of a film comprising:
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an etching chamber having one of a liner disposed in said etching chamber, said liner having a surface coated with Y2 O3 to reduce erosion of said liner in said plasma; and means for heating said surface to a temperature between 200°
C. to 325°
C. to impede the formation of a deposition film on said surface.
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23. In a system for having a flow of a plasma for etching a device, an apparatus for preventing the undesirable deposition of a film comprising:
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an etching chamber having one of a surface defining the etching chamber and a surface disposed in said etching chamber, where said surface is coated with Y2 O3 to reduce erosion of said surface in the flow of the plasma; and means for heating said surface to a temperature between 200°
C. to 325°
C. to impede the formation of a deposition film on said surface.
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Specification